Gradient descent through a differentiable diffraction model designs interference-lithography masks that reproduce a striped non-periodic target in simulation, with features at half the mask pixel pitch.
Au- tophasenn: unsupervised physics-aware deep learning of 3d nanoscale bragg coherent diffraction imaging,
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Inverse mask design for interference lithography using automatic differentiable wave propagation
Gradient descent through a differentiable diffraction model designs interference-lithography masks that reproduce a striped non-periodic target in simulation, with features at half the mask pixel pitch.