HfO2 ALD nucleation on CVD graphene is mediated by adventitious carbon contamination and depends on graphene layer number via copper substrate assistance.
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Resolving the Nucleation Stage in Atomic Layer Deposition of Hafnium Oxide on Graphene
HfO2 ALD nucleation on CVD graphene is mediated by adventitious carbon contamination and depends on graphene layer number via copper substrate assistance.