MBE-grown InAs p-i-n diodes under optimized conditions (450 C growth, 3x As2 flux, elevated In cell temperature) reach breakdown voltages above 0.3 V and reverse saturation current densities 200 times the radiative limit.
2 sketches the four InAs diode structures manufactured by molecular beam epitaxy (MBE) on a Veeco Gen 10
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Initial Development of MBE-Grown InAs Diodes for Thermoradiative Energy Harvesting
MBE-grown InAs p-i-n diodes under optimized conditions (450 C growth, 3x As2 flux, elevated In cell temperature) reach breakdown voltages above 0.3 V and reverse saturation current densities 200 times the radiative limit.