LDU-Bench evaluates multimodal LLMs on four lithography review tasks and finds a systematic drop-off from defect triage to morphology, localization, and cause analysis.
Journal of Micro/Nanopatterning, Materials, and Metrology , volume =
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LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds
LDU-Bench evaluates multimodal LLMs on four lithography review tasks and finds a systematic drop-off from defect triage to morphology, localization, and cause analysis.