Freestanding fluoropolymer (CYTOP) films are transferred as gate dielectrics onto hydrogen-terminated diamond FETs, giving ~7–8 MV/cm breakdown, ~400 cm²/V·s hole mobility, and ≤3×10¹¹ cm⁻²eV⁻¹ interface trap density.
HfO2 on MoS 2 by Atomic Layer Deposition: Adsorption Mechanisms and Thickness Scalability,
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Transfer of Freestanding Fluoropolymer Films for Advanced Semiconductor Devices
Freestanding fluoropolymer (CYTOP) films are transferred as gate dielectrics onto hydrogen-terminated diamond FETs, giving ~7–8 MV/cm breakdown, ~400 cm²/V·s hole mobility, and ≤3×10¹¹ cm⁻²eV⁻¹ interface trap density.