Soaking monolayer WSe2 in chloroform p-dopes the material, raising hole current by over 100 times and cutting contact resistance to about 2.5 kOhm·um.
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Low Resistance P-type Contacts to Monolayer WSe$_2$ through Chlorinated Solvent Doping
Soaking monolayer WSe2 in chloroform p-dopes the material, raising hole current by over 100 times and cutting contact resistance to about 2.5 kOhm·um.