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Effect of Thermal Annealing o n Boron Diffusion, Micro-Structural, Electrical and Magnetic Properties of Laser Ablated CoFeB Thin Films

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Correction Crossref 1 open · 1 total · 0 disputed
DOI
10.1063/1.4816811
Notice DOI
10.1063/1.4820356
Event date
2013-08-29
Machine twin
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01One-hop citing occurrences

Correction Open
Compact pulsed laser deposition system for in-situ polarized neutron reflectometry

ref [38] · 2501.08108 · notice #9632 · dispute

Raw extraction · citation context

Applied Surface Science 2021, 568, 150857, doi:10.1016/j.apsusc.2021.150857. 38. Swamy, G.V.; Pandey, H.; Srivastava, A.K.; Dalai, M.K.; Maurya, K.K.; Rashmi; Rakshit, R.K. Effect of Thermal Annealing o n Boron Diffusion, Micro-Structural, Electrical and Magnetic Properties of Laser Ablated CoFeB Thin Films. AIP Advances 2013, 3, 072129, doi:10.1063/1.4816811. 39. Mukherjee, S.; Knut, R.; Mohseni, S.M.; Anh Nguyen, T.N.; Chung, S.; Tuan Le, Q.; Åkerman, J.; Persson, J.; Sahoo, A.; Hazarika, A.; et al. Role of Boron Diffusion in CoFeB/MgO Magnetic Tunnel Junctions. Phys. Rev. B 2015, 91, 085311, doi:10.1103/PhysRevB.91.085311. 40. An, G.-G.; Lee, J.-B.; Yang, S.-M.; Kim, J.-H.; Chung, W.-S.; Hong, J.

Parser render (TeX stripped for reading; raw above is the evidence)

Applied Surface Science 2021, 568, 150857, doi:10.1016/j.apsusc.2021.150857. 38. Swamy, G.V.; Pandey, H.; Srivastava, A.K.; Dalai, M.K.; Maurya, K.K.; Rashmi; Rakshit, R.K. Effect of Thermal Annealing o n Boron Diffusion, Micro-Structural, Electrical and Magnetic Properties of Laser Ablated CoFeB Thin Films. AIP Advances 2013, 3, 072129, doi:10.1063/1.4816811. 39. Mukherjee, S.; Knut, R.; Mohseni, S.M.; Anh Nguyen, T.N.; Chung, S.; Tuan Le, Q.; Åkerman, J.; Persson, J.; Sahoo, A.; Hazarika, A.; et al. Role of Boron Diffusion in CoFeB/MgO Magnetic Tunnel Junctions. Phys. Rev. B 2015, 91, 085311, doi:10.1103/PhysRevB.91.085311. 40. An, G.-G.; Lee, J.-B.; Yang, S.-M.; Kim, J.-H.; Chung, W.-S.; Hong, J

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