Ion-neutral and neutral-neutral scattering in argon at KeV energies and implications for high-aspect-ratio etching

In this study, we report a physical model and a Monte Carlo simulation scheme developed to predict the angular distributions of energetic argon atoms and ions as an ion beam passes through a gas-filled volume. The study explores charge-exchange neutralization as a method for generating fast neutral beams suitable for low-damage, high aspect ratio (HAR) etching. The proposed model and simulation code are straightforward and compact, potentially making them useful tools for prototyping.