pith. sign in

arxiv: 0809.2177 · v1 · submitted 2008-09-12 · ⚛️ physics.plasm-ph

Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2

classification ⚛️ physics.plasm-ph
keywords mixturec2h2capacitivedischargeheavyhydrocarbonsprocessesproperties
0
0 comments X
read the original abstract

We study the properties of a capacitive 13.56 MHz discharge properties with a mixture of Ar/C2H2 taking into account the plasmochemistry and growth of heavy hydrocarbons. A hybrid model was developed to combine the kinetic description for electron motion and the fluid approach for negative and positive ions transport and plasmochemical processes. A significant change of plasma parameters related to injection of 5.8% portion of acetylene in argon was observed and analyzed. We found that the electronegativity of the mixture is about 30%. The densities of negatively and positively charged heavy hydrocarbons are sufficiently large to be precursors for the formation of nanoparticles in the discharge volume.

This paper has not been read by Pith yet.

discussion (0)

Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.