Time-Gated Optical Spectroscopy of Field-Effect Stimulated Recombination via Interfacial Point Defects in Fully-Processed Silicon Carbide Power MOSFETs

Fully-processed SiC power metal-oxide-semiconductor field-effect transistors (MOSFETs) emit light during switching of the gate terminal, while both drain and source terminals are grounded. The emitted photons are caused by defect-assisted recombination of electrons and holes at the 4H-SiC/SiO$_2$ interface and can be detected through the SiC substrate. Here, we present time-gated spectroscopic characterization of these interfacial point defects. Unlike in previous studies, the devices were opened in such a way that the drain-contact remained electrically active. A separate examination of the photons emitted at the rising and falling transitions of the gate-source voltage enabled the extraction of two different spectral components. One of these components consists of a single transition with phonon replicas of a local vibrational mode (LVM) with an astonishingly high energy of 220 meV $\unicode{x2013}$ well above the highest phonon modes in 4H-SiC and SiO$_2$ of 120 meV and 137 meV, respectively. Based on a quantum mechanical model, we successfully fitted its emission spectrum and assigned it to donor-acceptor pair recombination involving a carbon cluster-like defect. Other transitions were assigned to EH$_{6/7}$-assisted, EK$_2$-D, and nitrogen-aluminum donor-acceptor pair recombination. Due to the relevance of these defects in the operation of SiC MOSFETs, these novel insights will contribute to improved reliability and performance of these devices.