Combined Raman spectroscopy and electrical transport measurements in ultra-high vacuum down to 3.7 K

An instrument for the simultaneous characterization of thin films by Raman spectroscopy and electronic transport down to 3.7 K has been designed and built. This setup allows for the in-situ preparation of air-sensitive samples, their spectroscopic characterization by Raman spectroscopy with different laser lines and five-probe electronic transport measurements using sample plates with prefabricated contacts. The lowest temperatures that can be achieved on the sample are directly proven by measuring the superconducting transition of a Niobium film. The temperature-dependent Raman shift and narrowing of the Silicon F_{2g} Raman line are shown. This experimental system is specially designed for in-situ functionalization, optical spectroscopic and electron transport investigation of thin films. It allows for easy on-the-fly change of samples without the need to warm up the cryomanipulator.