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3 kV Monolithic Bidirectional GaN HEMT on Sapphire

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arxiv 2410.16218 v1 pith:5XJCWW6S submitted 2024-10-21 physics.app-ph

classification physics.app-ph
keywords breakdownvoltagebidirectionalmonolithicfabricatedfieldfirsthemts
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More than 3 kV breakdown voltage was demonstrated in monolithic bidirectional GaN HEMTs for the first time having potential applications in 1200V or 1700V-class novel power converters. The on resistance of the fabricated transistors was ~20 ohm.mm or ~11 mili ohm.cm^2. Breakdown voltage was optimized by utilizing two field plates in either side of the transistor and optimizing their geometry. Shorter first field plate lengths (less than 2 micron) resulted in higher breakdown voltage and the possible reason for this was discussed. The transistors had a steep subthreshold swing of 92 mV / dec. The on/off ratio was greater than 10^5 and it was limited by the tool capacity. The fabricated 3 kV transistor was benchmarked against the state-of-the-art monolithic bidirectional GaN HEMTs in the performance matrices of breakdown voltage and on resistance, that showed crucial progress.

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