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High Contrast Nulling in Photonic Meshes Through Architectural Redundancy
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We demonstrate a silicon photonic architecture comprised of Double Mach-Zehnder Interferometers (DMZIs) designed for high-contrast photonic applications. This configuration significantly enhances the achievable extinction ratio of photonic integrated circuits (PICs), reaching levels exceeding 80 dB. By leveraging the tunable properties of DMZIs and implementing a systematic configuration algorithm, the proposed mesh effectively compensates for fabrication imperfections and mitigates non-idealities such as back reflections. Experimental validation on a silicon-on-insulator platform demonstrates the potential of this approach for applications requiring high contrast nulling such as astronomical sensing.
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Cited by 1 Pith paper
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Low-loss, fabrication-tolerant, and highly-tunable Sagnac loop reflectors and Fabry-P\'erot cavities on thin-film lithium niobate
Tunable Sagnac-loop-based Fabry-Perot cavities on thin-film lithium niobate yield an inferred per-MZI loss below 1.5% and a thermo-optic phase-shift power of 2.5 mW.
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