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Paper Citation Record · LEDGER

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering

As of 23 August 2026, this Paper Citation Record lists 68 of 68 outbound references and 0 inbound Pith citation observations for arXiv:2505.06809.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2505.06809 v1

Coverage vector

measured 68 of 68 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-15T22:36:29.924293Z

measured 68 of 68 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-23T06:30:58.430688+00:00

measured 0 of 0 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

68 of 68 outbound references displayed

  • verified exact0
  • verified fuzzy56
  • unresolved12
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation b6783f55-d6fe-4f61-8a67-15db32acbe00 · outbound

This paper cites J.; Xia, Q.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering J.; Xia, Q

Reference 1

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.721184Z digest=sha256:4a922befb251f168ffad61b3f9e587dfc4c510c90d0e873aa0e9f0856e3a9401

Observation 99afb63c-993e-4dcb-9e82-63663e1848be · outbound

This paper cites J.; Kim, Y.; Hwang, C.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering J.; Kim, Y.; Hwang, C

Reference 2

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.724824Z digest=sha256:8e974eb7b2615965baca0b127ad9df8f1befe83090cdf7fee6793fe52cfab4f9

Observation d4f76ee6-ea85-486d-a82d-f53316546870 · outbound

This paper cites an unresolved cited work.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Unresolved cited work

Reference 3

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No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.727800Z digest=sha256:c90b48be64aa1d82d88378cf8f28e52166e75aebb883aa01de55a4450aedf929

Observation d98d31aa-70ae-4ff5-94dd-d713f9827e1b · outbound

This paper cites an unresolved cited work.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Unresolved cited work

Reference 4

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no resolver link, observed 2026-08-15T22:36:29.731046Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T22:36:29.731046Z digest=sha256:8f735268d87ce72025b9689fa32e035e3e3df61919d165054e9d44daee04f127

Observation c2da3fa5-8bfc-4f1d-b029-6289037cb73e · outbound

This paper cites Nanoionic memristive phenomena in metal oxides: the valence change mechanism.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Nanoionic memristive phenomena in metal oxides: the valence change mechanism

Reference 5

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no resolver link, observed 2026-08-15T22:36:29.734527Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T22:36:29.734527Z digest=sha256:b3b4a839c221519c892618364f60453dfd6304dbd5c99b14d9fd208602a1d00c

Observation 30f7c9cf-fdff-4d70-b9df-89801cc95270 · outbound

This paper cites Forming voltage scaling of resistive switching memories.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Forming voltage scaling of resistive switching memories

Reference 6

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.737724Z digest=sha256:25fec900514e3ed42f7f19669aeea300f3257e1a3ed125fa33cb47d3d305d002

Observation 6e2c277d-2479-44a2-9313-6758df3cb1b9 · outbound

This paper cites B.; Lee, H.-D.; Kwon, H.-M.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering B.; Lee, H.-D.; Kwon, H.-M

Reference 7

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.741258Z digest=sha256:3be7e623cd3b449e3051771e1be444b7498dee17c2aeb92d7a2d6546bce02498

Observation 90359b60-7fe7-4263-a1ff-33daca50b190 · outbound

This paper cites The Effect of Plasma Treatment on Reducing Electroforming Voltage of Silicon Oxide RRAM.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering The Effect of Plasma Treatment on Reducing Electroforming Voltage of Silicon Oxide RRAM

Reference 8

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.744163Z digest=sha256:d6662bee4d87d072a20df094621e1cbc594da4a66d1e5a788a2e920a0a0c21a2

Observation 29329e0a-fa1b-44f0-a855-6182e5913d86 · outbound

This paper cites Controllable Growth of Nanoscale Conductive Filaments in Solid-Electrolyte-Based ReRAM by Using a Metal Nanocrystal Covered Bottom Electrode.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Controllable Growth of Nanoscale Conductive Filaments in Solid-Electrolyte-Based ReRAM by Using a Metal Nanocrystal Covered Bottom Electrode

Reference 9

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raw_fallback, observed 2026-08-15T22:36:30.479328Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.746869Z digest=sha256:061d88c4352b9b2811ea7df09954fbf902150ef2df4ead90b159037d3c661ae6

Observation 7895bf49-fbaf-4e4f-8389-210c75cef372 · outbound

This paper cites Geometric conductive filament confinement by nanotips for resistive switching of HfO _2 -RRAM devices with high performance.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Geometric conductive filament confinement by nanotips for resistive switching of HfO _2 -RRAM devices with high performance

Reference 10

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.749708Z digest=sha256:0430a44602ddcc73af208e4542d60e5f32baaeee9f2c43880156a29aae1c3374

Observation c15cca47-0204-47c6-a599-1757184d42d8 · outbound

This paper cites Collective Control of Potential-Constrained Oxygen Vacancies in Oxide Heterostructures for Gradual Resistive Switching.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Collective Control of Potential-Constrained Oxygen Vacancies in Oxide Heterostructures for Gradual Resistive Switching

Reference 11

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.752643Z digest=sha256:26b4ca47fec822fa58a2bead52f0616db216c17dc8302f5e418cf7536d5b3cf5

Observation c042cee7-ea14-409e-801c-cbf50c59eb95 · outbound

This paper cites Resistive Switching Acceleration Induced by Thermal Confinement.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Resistive Switching Acceleration Induced by Thermal Confinement

Reference 12

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.755816Z digest=sha256:af10185ff0c5f72980144eb3c56aade769c0e978ce3a7d2609e2d0a232ca040e

Observation 26c6fbb0-19c6-4fe3-ba86-be9b268f67cf · outbound

This paper cites Improving Analog Switching in HfO _2 -Based Resistive Memory With a Thermal Enhanced Layer.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Improving Analog Switching in HfO _2 -Based Resistive Memory With a Thermal Enhanced Layer

Reference 13

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.758675Z digest=sha256:3cb21193e7b89b2a6d75198e07fee7e0aeb8f373aa49f8b35a0ce32204d138a0

Observation 30f20bc6-ea77-4dd3-b85b-0043e47c67a2 · outbound

This paper cites an unresolved cited work.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Unresolved cited work

Reference 14

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.761457Z digest=sha256:a4dced93494da1eed8ad66fe651ede5b01f5442bd2d4612febd0444b0ace78ad

Observation 2450a0c6-c10b-4d44-acb2-b06bb6a877cf · outbound

This paper cites Analog Nanoscale Electro-Optical Synapses for Neuromorphic Computing Applications.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Analog Nanoscale Electro-Optical Synapses for Neuromorphic Computing Applications

Reference 15

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.764348Z digest=sha256:f9dac3c28d7d4d0800a73afc3e503f2330bba111b41ffc63fae2bfcd7767ce93

Observation 2ee60057-1290-419e-a344-f7c8c1808912 · outbound

This paper cites J.; Qian, H.; Wu, H.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering J.; Qian, H.; Wu, H

Reference 16

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.767398Z digest=sha256:e6f1f59b21d3f10cb2834ae03b1d0dd4198390447cd3b0ca92adab58f39444b0

Observation d2c27ab0-9ed3-4e9e-9816-b393946fd810 · outbound

This paper cites L.; Islam, M.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering L.; Islam, M

Reference 17

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No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.770463Z digest=sha256:0ba7065913413dd7c06bd6413bff7c05501e66e2abef8495bbc01c6a6c59f287

Observation c622e7f1-555b-4d06-accc-014a6bed661b · outbound

This paper cites An Atomistic Model of Field-Induced Resistive Switching in Valence Change Memory.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering An Atomistic Model of Field-Induced Resistive Switching in Valence Change Memory

Reference 18

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.773519Z digest=sha256:957fb4aa888ecaa4a85e3c9889258d7446dcd95d5b881580975b0e226d4c0734

Observation e767766b-b80f-4f8b-b7bf-cea52adc63bb · outbound

This paper cites S.; Williams, R.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering S.; Williams, R

Reference 19

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No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.776538Z digest=sha256:bc7b5b7c6b2f54cf1f7c60b7c52e728a3e83f268539453a5a59b18507e6b77be

Observation 5a6686be-478b-4566-85c4-680d948ed94a · outbound

This paper cites Effect of electrode and oxide properties on the filament kinetics during electroforming in metal-oxide-based memories.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Effect of electrode and oxide properties on the filament kinetics during electroforming in metal-oxide-based memories

Reference 20

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.779741Z digest=sha256:e6205e59d2dd7080206b4b8ba3dc65c94a99488366afa560124ba4516e53505a

Observation 0cf18ebb-e612-4dc9-92ab-422f49e86ba0 · outbound

This paper cites Insights into few-atom conductive bridging random access memory cells with a combined force-field/ab initio scheme.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Insights into few-atom conductive bridging random access memory cells with a combined force-field/ab initio scheme

Reference 21

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Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.782907Z digest=sha256:d430030c2663c491deedcbfdabe5e9100c74f858acdfee08aebd3a0c4ff9e208

Observation 4930e2e3-b2f0-4df4-96dd-7aea1b1572b4 · outbound

This paper cites Three-Dimensional Observation of the Conductive Filament in Nanoscaled Resistive Memory Devices.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Three-Dimensional Observation of the Conductive Filament in Nanoscaled Resistive Memory Devices

Reference 22

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raw_fallback, observed 2026-08-15T22:36:30.368363Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.785940Z digest=sha256:dd69ca3ca6113d5094641695593b3a842a4f6cbac83d470629b3bdab0a4b72d0

Observation d289dfb8-98c7-4cf1-885e-3c4da303cd6b · outbound

This paper cites Imaging the Three-Dimensional Conductive Channel in Filamentary-Based Oxide Resistive Switching Memory.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Imaging the Three-Dimensional Conductive Channel in Filamentary-Based Oxide Resistive Switching Memory

Reference 23

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verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.359017Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.788809Z digest=sha256:278116374ad56975b1826b6979c28a2b6dfeffcabee4a42cee1bdbb57f1f07b4

Observation 9119b922-b370-400c-ad07-c361ec17d69f · outbound

This paper cites P.; Shen, L.; Goodwill, J.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering P.; Shen, L.; Goodwill, J

Reference 24

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raw_fallback, observed 2026-08-15T22:36:30.350231Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.791645Z digest=sha256:0c04a4de438a212d955d6163584c5c4a466f52f6a8ac4331d8241d1e37229dc7

Observation 45350c2d-c2f0-40e0-a07c-56a009ede5f1 · outbound

This paper cites F.; Menzel, S.; Stecconi, T.; Porta, A.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering F.; Menzel, S.; Stecconi, T.; Porta, A

Reference 25

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raw_fallback, observed 2026-08-15T22:36:30.341697Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.794658Z digest=sha256:3bd0df67ace65233cf9af1464aef72b63368af471c74c607c04d8b9cd57625c7

Observation 849dfc5e-8682-4edd-999c-00ef161f63a8 · outbound

This paper cites J.; Carta, F.; Horst, F.; Falcone, D.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering J.; Carta, F.; Horst, F.; Falcone, D

Reference 26

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raw_fallback, observed 2026-08-15T22:36:30.332820Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.797605Z digest=sha256:eb743214d81fbeec3903658e23bd666009e3a4b785dcd0a8be31c98af03bd34a

Observation 76cacb4f-9c72-4a27-856c-d991e58838cf · outbound

This paper cites J.; Bragaglia, V.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering J.; Bragaglia, V

Reference 27

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verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.323818Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.800463Z digest=sha256:3139425fea7be2e813870b79570625794eaa21114eee8d9d6ec3b173527adcd0

Observation 1d1b2708-6ca7-483d-ac12-cef786925dab · outbound

This paper cites Insights behind multi-level conductance transitions in HfO _x memristors.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Insights behind multi-level conductance transitions in HfO _x memristors

Reference 28

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verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.315222Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.803746Z digest=sha256:d81ae1c48ef358cd7f31c60ec44397c52b35180662277b257824cf3dfa475c37

Observation 6975dd36-1f47-4a3f-a672-eeca5bf10fb9 · outbound

This paper cites an unresolved cited work.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Unresolved cited work

Reference 29

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unresolved
raw_fallback, observed 2026-08-15T22:36:30.306533Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.806659Z digest=sha256:f46475435325742efe3dbb292f238787b40ec2fd5d92bbf93ca2771a73db614d

Observation 246f1615-92f0-4855-8fc5-c3acd78e47d4 · outbound

This paper cites 10x10nm Hf/HfO _2 crossbar resistive RAM with excellent performance, reliability and low-energy operation.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering 10x10nm Hf/HfO _2 crossbar resistive RAM with excellent performance, reliability and low-energy operation

Reference 30

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raw_fallback, observed 2026-08-15T22:36:30.297597Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.809556Z digest=sha256:c3452ba1e28135c80b36f666ef8bd4145a9b32287d239b0e546be9599d4f0052

Observation 3a66aaea-9653-427a-95d5-ec6eac5b90e7 · outbound

This paper cites M.; Lin, C.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering M.; Lin, C

Reference 31

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raw_fallback, observed 2026-08-15T22:36:30.288538Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.812418Z digest=sha256:565667302b9d0fb7f5f8600c0e8b6d5087a9e59ee227727d7adea0f53af46ccb

Observation 3c1d90f4-712e-4755-ba77-fbd46658ca75 · outbound

This paper cites an unresolved cited work.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Unresolved cited work

Reference 32

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unresolved
raw_fallback, observed 2026-08-15T22:36:30.279773Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.815332Z digest=sha256:53500940f432c7aa89bdc4b476d3d627739a0c5ec93ad53ddf905bd9356d66c8

Observation c99fcad9-1aac-4d17-a38f-b1217c076eba · outbound

This paper cites an unresolved cited work.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Unresolved cited work

Reference 33

Resolution
unresolved
raw_fallback, observed 2026-08-15T22:36:30.270769Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.818428Z digest=sha256:5c1393b8de6b0328d6ac73138f4021bddcb06f113dc64d634b133f5157bad90b

Observation ecbfbecd-ae26-4e9c-9719-7c99c1a25c35 · outbound

This paper cites In-operando and non-destructive analysis of the resistive switching in the Ti/HfO _2 /TiN-based system by hard x-ray photoelectron spectroscopy.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering In-operando and non-destructive analysis of the resistive switching in the Ti/HfO _2 /TiN-based system by hard x-ray photoelectron spectroscopy

Reference 34

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.261902Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.821324Z digest=sha256:b1aef56be581f7a1e1d523a64021ef3517d44f0eaceb0be2c72c76e7d549b425

Observation db9a1761-5161-44be-972f-c321e2688f6c · outbound

This paper cites C.; Kirsch, P.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering C.; Kirsch, P

Reference 35

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.253715Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.824259Z digest=sha256:b456ae5eae64ff9a76aaf1c7820a20609b64e1d091487b6b8cfe6854af1121b3

Observation 191756ec-6cf4-44a0-a807-7fafa1851997 · outbound

This paper cites A.; Lodico, J.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering A.; Lodico, J

Reference 36

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.245592Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.827594Z digest=sha256:8c50f0d8c659fa59a3955672746126054b430027830c6fe286d642c8dc2913d9

Observation 0c51a575-fcfc-4c9c-b65b-7a47a00c2264 · outbound

This paper cites P.; Sohn, J.; Weng, B.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering P.; Sohn, J.; Weng, B

Reference 37

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.237594Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.830697Z digest=sha256:d9ea33a3544615770d6bddbc272057e1259edcb6c323ee21a55f327eb274025f

Observation fcc54fb1-ad54-45e9-b900-f6cde924237a · outbound

This paper cites Y.; Nagata, T.; Park, S.-G.; Magyari-K\" o pe, B.; Chikyow, T.; Yamada, K.; Niwa, M.; Nishi, Y.; Shiraishi, K.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Y.; Nagata, T.; Park, S.-G.; Magyari-K\" o pe, B.; Chikyow, T.; Yamada, K.; Niwa, M.; Nishi, Y.; Shiraishi, K

Reference 38

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.229125Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.833380Z digest=sha256:46dff5dc47973e76e6856a799c0411a2a4909f7d214c212faee03aff7f71e1ed

Observation d323aa86-bf56-4790-9a37-860287d83d28 · outbound

This paper cites an unresolved cited work.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Unresolved cited work

Reference 39

Resolution
unresolved
raw_fallback, observed 2026-08-15T22:36:30.220325Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.836447Z digest=sha256:640fca1fcca3674d14076c0d1912b5ea07e9ffced718b25d326263437d5b1c63

Observation d3a1742d-202e-4bd3-9a88-ff9c8bca045a · outbound

This paper cites Y.; Degraeve, R.; Mees, M.; Sankaran, K.; Govoreanu, B.; Jurczak, M.; De Gendt, S.; Pourtois, G.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Y.; Degraeve, R.; Mees, M.; Sankaran, K.; Govoreanu, B.; Jurczak, M.; De Gendt, S.; Pourtois, G

Reference 40

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.211323Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.839512Z digest=sha256:c1dcec62ab375f630473c794262f0b13a992040f3e4059258de3b56f6fabbad3

Observation b01ac73d-5a4f-4a73-beba-edda90fe31d4 · outbound

This paper cites A Comparative Study on the Diffusion Behaviors of Metal and Oxygen Ions in Metal-Oxide-Based Resistance Switches via ab Initio Molecular Dynamics Simulations.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering A Comparative Study on the Diffusion Behaviors of Metal and Oxygen Ions in Metal-Oxide-Based Resistance Switches via ab Initio Molecular Dynamics Simulations

Reference 41

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.202198Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.842609Z digest=sha256:6a2a5230445fc09f6f3352e8061a5a1530e57169876a120cd4c219c528f66835

Observation 6a2d3fb0-66c5-4d78-8612-ae3817e6e494 · outbound

This paper cites Direct Imaging of Ion Migration in Amorphous Oxide Electronic Synapses with Intrinsic Analog Switching Characteristics.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Direct Imaging of Ion Migration in Amorphous Oxide Electronic Synapses with Intrinsic Analog Switching Characteristics

Reference 42

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.192193Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.845443Z digest=sha256:a179dd96234b9746f01fa1251b639acd2bf59e849c83b8213c683ae0d4da59bd

Observation b7b03816-5b09-4da0-b812-c83f88468bf0 · outbound

This paper cites Investigation of the electroforming process in resistively switching TiO _2 nanocrosspoint junctions.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Investigation of the electroforming process in resistively switching TiO _2 nanocrosspoint junctions

Reference 43

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.183342Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.848388Z digest=sha256:0cdf49ac108d26ac26869cc95cd05f3ab485449dd3516db6439fd16af578ef23

Observation 86ca9590-54a6-4e1b-bc27-cf9cf153e0e1 · outbound

This paper cites An Electrical Characterisation Methodology for Benchmarking Memristive Device Technologies.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering An Electrical Characterisation Methodology for Benchmarking Memristive Device Technologies

Reference 44

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.174448Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.851622Z digest=sha256:ab7241af8cd578b40ccb73dff80fda324438255fb4201dd154de9399e796f0ef

Observation e954768b-dbc9-4c44-8b56-298e685f9f16 · outbound

This paper cites Dielectric properties of hafnium oxide film prepared by HiPIMS at different O _2 /Ar ratios and their influences on TFT performance.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Dielectric properties of hafnium oxide film prepared by HiPIMS at different O _2 /Ar ratios and their influences on TFT performance

Reference 45

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.165960Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.854541Z digest=sha256:85913a0dc57247b4ae484bab5530c571a759c17f07088dce9982aecad4c961a7

Observation fc462c6e-f95f-439e-8062-ba477f2a1d5f · outbound

This paper cites U.; Bertaud, T.; Kurian, J.; Hildebrandt, E.; Walczyk, C.; Calka, P.; Zaumseil, P.; Sowinska, M.; Walczyk, D.; Gloskovskii, A.; Schroeder, T.; Alff, L.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering U.; Bertaud, T.; Kurian, J.; Hildebrandt, E.; Walczyk, C.; Calka, P.; Zaumseil, P.; Sowinska, M.; Walczyk, D.; Gloskovskii, A.; Schroeder, T.; Alff, L

Reference 46

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.157180Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.857370Z digest=sha256:788702dc21a44fddf98515a55f2916e940e37d36a3582b55125f5c83a23d6f9e

Observation 7ed97bd6-9371-48f2-9547-81d1b8ead095 · outbound

This paper cites U.; Kurian, J.; Komissinskiy, P.; Hildebrandt, E.; Bertaud, T.; Walczyk, C.; Calka, P.; Schroeder, T.; Alff, L.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering U.; Kurian, J.; Komissinskiy, P.; Hildebrandt, E.; Bertaud, T.; Walczyk, C.; Calka, P.; Schroeder, T.; Alff, L

Reference 47

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.148234Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.860326Z digest=sha256:e4a104424a3d3e11125ceec0e869d91d52d99eb43e24c24cb15091f413881ea0

Observation f7f99214-61b8-4e0e-a7a3-d986de9f721d · outbound

This paper cites V.; Taguchi, M.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering V.; Taguchi, M

Reference 48

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.140067Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.863363Z digest=sha256:f9f9c7f71afe8b670ceeedcc2ded198b28d0be6dad8a56079675eaf54d770016

Observation b235c7ac-b627-44ac-90da-892eb80aecf2 · outbound

This paper cites P.; Molina‐Luna, L.; Alff, L.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering P.; Molina‐Luna, L.; Alff, L

Reference 49

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.131785Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.866448Z digest=sha256:21844db36213577846989c2791a1fb60bad042849336c57bb208549d8a08abe4

Observation 3b1c57be-7b2c-4a61-b998-0d466eef871e · outbound

This paper cites U.; Vogel, T.; Major, M.; McKenna, K.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering U.; Vogel, T.; Major, M.; McKenna, K

Reference 50

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.123184Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.869541Z digest=sha256:ed3fbe4b0e25d0067ce280ae8363bb40ff5e2419a5381e99123f7fd619609422

Observation 1ccea759-a2a1-4690-a8e6-46778d9793e7 · outbound

This paper cites Oxygen Vacancy Engineering and Its Impact on Resistive Switching of Oxide Thin Films for Memory and Neuromorphic Applications.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Oxygen Vacancy Engineering and Its Impact on Resistive Switching of Oxide Thin Films for Memory and Neuromorphic Applications

Reference 51

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.114465Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.872451Z digest=sha256:ccecd1f6a93907ffe51cc6312f182cb5e2b53be7aa1af17c5aa0294f14fbab01

Observation ac24600b-2ce4-4227-8f9b-2819f3283591 · outbound

This paper cites P.; Vine, D.; Kilcoyne, A.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering P.; Vine, D.; Kilcoyne, A

Reference 52

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.105339Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.875620Z digest=sha256:991bf1df2205a93bdb64d727fa32ec043fcf35a1c24ab376620192f64a4310b1

Observation f03a300c-d05e-4dec-8393-673cb30184a3 · outbound

This paper cites Effect of the voltage ramp rate on the set and reset voltages of ReRAM devices.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Effect of the voltage ramp rate on the set and reset voltages of ReRAM devices

Reference 53

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.096218Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.878601Z digest=sha256:d1d199e8f6c8e1f0e0e7dbb59069eefb783c971a6dd2f4f8bd875bb058692e85

Observation 24123303-0c8a-4df9-9260-610098578305 · outbound

This paper cites A thorough investigation of the progressive reset dynamics in HfO _2 -based resistive switching structures.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering A thorough investigation of the progressive reset dynamics in HfO _2 -based resistive switching structures

Reference 54

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.087581Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.881349Z digest=sha256:9006ffdce9a0101a899e8bd28eb69573d524b69197c2819164eecff4a11e6e85

Observation 3f85f9cc-a4a8-4013-96a6-7b2d5a58940d · outbound

This paper cites Rapid Prediction of RRAM RESET-State Disturb by Ramped Voltage Stress.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Rapid Prediction of RRAM RESET-State Disturb by Ramped Voltage Stress

Reference 55

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.078571Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.884245Z digest=sha256:5e0647e61069a280941a17d14bc9f756a90b0b2029cc5dbbe89bc3d661d5b6ca

Observation 945d59bc-24f3-4ca5-908c-a41dddbfa7c4 · outbound

This paper cites an unresolved cited work.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Unresolved cited work

Reference 56

Resolution
unresolved
raw_fallback, observed 2026-08-15T22:36:30.069109Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.887285Z digest=sha256:330e887d4de75e3a3ddfb1cce9ddb1bc7972fcc99f707c989748175a653c37e8

Observation 7aafd729-d41b-418b-855e-346dc8672e0d · outbound

This paper cites M.; Liu, H.-W.; Chen, P.-H.; Chang, T.-C.; Tsai, T.-M.; Chu, T.-J.; Pan, C.-H.; Wu, C.-H.; Yang, C.-C.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering M.; Liu, H.-W.; Chen, P.-H.; Chang, T.-C.; Tsai, T.-M.; Chu, T.-J.; Pan, C.-H.; Wu, C.-H.; Yang, C.-C

Reference 57

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.059442Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.890112Z digest=sha256:ba22609fec21fb9dacd4424edef83ac22a4728055e9acdf61b7d7cdf65588538

Observation ec952f7d-f297-4f52-a654-f4dbe9679183 · outbound

This paper cites J.; Gerstner, W.; Luisier, M.; Emboras, A.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering J.; Gerstner, W.; Luisier, M.; Emboras, A

Reference 58

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.049173Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.893011Z digest=sha256:4ebe5adef17b17c69ebbf9dc1fe7c894cc8477876302b8005238989f840ece0c

Observation 2f1724cc-8d61-44a7-b9ad-0e3bae35da77 · outbound

This paper cites LEPTOS: a universal software for x-ray reflectivity and diffraction.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering LEPTOS: a universal software for x-ray reflectivity and diffraction

Reference 59

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.039864Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.896062Z digest=sha256:bf1626f55cf36d09105af698cef74e9ff5f86139bd57f482bf6035677c3799a7

Observation a4cb35da-11ca-468d-ad0f-ef42c3a02389 · outbound

This paper cites an unresolved cited work.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Unresolved cited work

Reference 60

Resolution
unresolved
raw_fallback, observed 2026-08-15T22:36:30.029761Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.899314Z digest=sha256:1385fb20feebcf3ee4a40bf002b18684462860deb9aa1913cd13b6d959c9633c

Observation 25ad029e-c20f-48fd-8163-87c04b8584fc · outbound

This paper cites u hne, T. D.; Iannuzzi, M.; Ben, M. D.; Rybkin, V. V.; Seewald, P.; Stein, F.; Laino, T.; Khaliullin, R. Z.; Sch\.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering u hne, T. D.; Iannuzzi, M.; Ben, M. D.; Rybkin, V. V.; Seewald, P.; Stein, F.; Laino, T.; Khaliullin, R. Z.; Sch\

Reference 61

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.020155Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.902503Z digest=sha256:1d3da6689651942679f26d38fa2e1d6fe030f7cd2f98480dd85ff50675bd1695

Observation b5352c45-9396-433a-9f27-c361396723e6 · outbound

This paper cites P.; Burke, K.; Ernzerhof, M.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering P.; Burke, K.; Ernzerhof, M

Reference 62

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:30.010565Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.905497Z digest=sha256:ac597e4f008f38a19393998520490df1d444e79a055f513b91a02d88936436ef

Observation 221e9a54-6122-4d91-8d77-755293c65bda · outbound

This paper cites Gaussian basis sets for accurate calculations on molecular systems in gas and condensed phases.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Gaussian basis sets for accurate calculations on molecular systems in gas and condensed phases

Reference 63

Resolution
unresolved
no resolver link, observed 2026-08-15T22:36:29.908683Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T22:36:29.908683Z digest=sha256:7c6b50b0cbf8e47b7e457d5b237d2fe1955504c8b95b270c83cb81d230d1d350

Observation cc31d67a-9ec5-4687-a057-5c6177384543 · outbound

This paper cites J.; Waser, R.; Schneider, C.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering J.; Waser, R.; Schneider, C

Reference 64

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:29.995330Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.911779Z digest=sha256:5d50441fdc5025877f9cd3863badc9129f2124ed4f9dd41692ddbce4dc922d41

Observation 89f18a76-17e2-4951-a1e6-56b44d8835fb · outbound

This paper cites Electro-Thermal Transport in Disordered Nanostructures: a Modeling Perspective.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Electro-Thermal Transport in Disordered Nanostructures: a Modeling Perspective

Reference 65

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:29.986162Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.914840Z digest=sha256:e074d87b8ec33b359d25b088b5f70697121449496e6b3793babdb16431f445ec

Observation 4da5ea9d-06a3-4d26-b9ae-f2e5eaceb644 · outbound

This paper cites Temperature Dependent Thermal Properties of Thin Film Hafnium Oxide.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Temperature Dependent Thermal Properties of Thin Film Hafnium Oxide

Reference 66

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:29.976408Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.917748Z digest=sha256:f8ec929c35a82034e4496bb322b17f096d89391d3300b72ab73d9f84fd6086d4

Observation 5bc86c0f-dc31-47ba-b799-9e07b696d7b7 · outbound

This paper cites W.; McIntyre, P.; Goodson, K.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering W.; McIntyre, P.; Goodson, K

Reference 67

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T22:36:29.965960Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

source=arxiv_source observed=2026-08-15T22:36:29.920974Z digest=sha256:189aee4985b6d92fc04896107104e2d6a43590b612349d648fd6613ebd5873be

Observation 442b4b59-ed6b-4ed1-938b-b7f49428e805 · outbound

This paper cites Improving equilibrium propagation without weight symmetry through Jacobian homeostasis.

Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms Behind Compositional and Thermal Engineering Improving equilibrium propagation without weight symmetry through Jacobian homeostasis

Reference 68

Resolution
unresolved
no resolver link, observed 2026-08-15T22:36:29.924293Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T22:36:29.924293Z digest=sha256:1112568fd7ccfeef8f09dd9dc66ea7ca27965af7adbf7fa3caee502d785489d6

Pith citing papers

No inbound Pith citation observations are available.