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Paper Citation Record · LEDGER

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions

As of 13 August 2026, this Paper Citation Record lists 28 of 28 outbound references and 0 inbound Pith citation observations for arXiv:2608.08031.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2608.08031 v1

Coverage vector

measured 28 of 28 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-12T00:36:14.618207Z

measured 28 of 28 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-13T06:32:02.005865+00:00

measured 0 of 0 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

28 of 28 outbound references displayed

  • verified exact0
  • verified fuzzy13
  • unresolved15
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation ccfb7891-e8ef-49a9-96ad-6419e7063b5c · outbound

This paper cites Abe, Y.Sonobe, and T.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Abe, Y.Sonobe, and T

Reference 1

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.909964Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.520738Z digest=sha256:173a6b0b4d09f7f04894d77f15d117ac2c0e05da59fcc3b01ea44560321f688d

Observation 48a9934b-32ca-470f-89a5-209da6d7f35e · outbound

This paper cites Hosokawa, R.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Hosokawa, R

Reference 2

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.900726Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.525588Z digest=sha256:6b7c2c6d5fb991fa267188db8bcf3d2e8e0901da8035068afccc7a88566139bb

Observation d20b3557-5087-4608-a417-68e582709931 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 3

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.891706Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.529397Z digest=sha256:679b3ead2b8acda295215371abf8ee62af18bd9b348af521d03a4124ee2d7206

Observation 3321b74e-070f-4262-9400-c8b584c18b34 · outbound

This paper cites Holland, and S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Holland, and S

Reference 4

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.882897Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.533653Z digest=sha256:fcb77f1139834b64371d58eb67ece7074bc7ca57c06db5e92476863d1b586da0

Observation 3e5091d9-b6c5-4b33-8be5-5dd7db6cf36f · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 5

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.873770Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.537925Z digest=sha256:2b8bd3f7a0f8da34fad1b5cc45a91e997237246a549e4eddfe8e0849c5bcf279

Observation 5c0b9888-8206-408c-a904-2e5300b4ea60 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 6

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.864943Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.542073Z digest=sha256:26dccae5ae9c62d6c16d149c09d807380f843028ddb9d4f393b3eb4110e14c68

Observation aca3addb-206e-4e84-8bc3-67f8c5032e09 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 7

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.855850Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.546115Z digest=sha256:69712361616341fd9722f6700b8a8affb2e3b0b9ae7839fd6afb7d292a286eba

Observation 58cce227-adcb-42f1-931b-608086ea17d3 · outbound

This paper cites K., Song I.-C., Lu S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions K., Song I.-C., Lu S

Reference 8

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.846510Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.549906Z digest=sha256:172c46212730b664ff6cd7f33238eb2cc01385155fdfeb578592a2b29cf691bd

Observation 9ee41961-cf89-4ab8-8180-fc196b3d9ecf · outbound

This paper cites and Lill T.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions and Lill T

Reference 9

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.837484Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.553475Z digest=sha256:7def00d1c2d641552cfdf1fad0e71c45f49cf52311f4707423a41c8c9a4e5351

Observation 0707c76a-3a2b-4f6b-b15f-c59d33e79f77 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 10

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.828069Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.556702Z digest=sha256:69fb0a69a75a03b6cc2a1403d6289ad1f3581d34a3bb534402dcfb75939fe7b5

Observation 9b397afe-6d8f-48db-a2c4-44b7608d7d9e · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 11

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.819269Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.559885Z digest=sha256:a052a6f7c6a49a64d23c02f343aeb7e611e0b4ad2b9028a05b217119e61265f2

Observation 1d083fb2-f8cc-43ee-ab6e-3b55370a3a29 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 12

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.809953Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.563347Z digest=sha256:d5266b69e7c0d8bdd1ff1d7e23ffb90fcdf62ce60aa7c33f82c056939ce6c979

Observation 665d2e67-53ac-465e-8fed-f42704e1b270 · outbound

This paper cites Tachi, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Tachi, K

Reference 13

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.801035Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.566625Z digest=sha256:a2a091b09818207feb54c105767127b365902aa75dabeb38818f2a05b6475160

Observation c9984631-9f8d-442e-97c5-849f4374bc14 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 14

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.792683Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.569923Z digest=sha256:08ad7cf493f377bac8f09898513eef94b4c924fb67d45b375e74550467925215

Observation 605f413c-66a2-4f3b-b428-7f49e0046282 · outbound

This paper cites Karahashi, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, K

Reference 15

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.784057Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.573345Z digest=sha256:7f93f36db35b20badad1c8ba874c78967849952dadabb97c620de806341c4c00

Observation 4b58c1ae-2798-44c6-ac1d-d8c4cbf6a414 · outbound

This paper cites Karahashi, and S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, and S

Reference 16

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.773962Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.576507Z digest=sha256:a269f9e8e037451f23342b40af01025f15637744b96747d9fde8f0b44ef1aee5

Observation 5cba6fc6-dfad-4074-af30-c2d36ed99e73 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 17

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.764636Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.579640Z digest=sha256:afee4f5c3e38ccc3bed6a9280c5f3a8bd5e761ced1ad59e204d462363aade789

Observation 70511fbb-d1e8-4491-8157-6e570225f465 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 18

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.754542Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.583233Z digest=sha256:e4706ba7b44596fbdc79446e01bb5860e21ed3838e2e487f199ccc7193fa206f

Observation fc77de31-f03a-4844-8e58-56a654ec70fb · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 19

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.744927Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.586396Z digest=sha256:0d6f63b73ff57966891a994aa81fcd6749e37cfe46e7f2119f416b6bf0762607

Observation 320aa820-613f-4ea6-9002-3bb98604d875 · outbound

This paper cites Karahashi, J.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, J

Reference 20

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.735610Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.589628Z digest=sha256:9160b5e29db3313e1f34b53313ccfcd5673029962a2780a4fcc1037cdc70e369

Observation bbd81f71-efe8-46aa-b09f-5099eb3c8e07 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 21

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.725114Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.592861Z digest=sha256:4bf81daf03978fbb125f74c012ce5228f3b5053532cac18b75ece497e5a7329d

Observation 0f6a3650-74eb-4f33-a3ff-30cf8a323ac7 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 22

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.714947Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.596750Z digest=sha256:07f35f3d848307b79164009c0047b6a2c8d63ce1bc1e5154738a7c349e4686de

Observation 62c89377-ab02-4b73-a9b9-a4bbb33f7db9 · outbound

This paper cites Karahashi, J.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, J

Reference 23

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.703032Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.600333Z digest=sha256:4f757093513e20da5cdad81b28f1c098100faa7134090938477d05d1a4f05b23

Observation dbf877d8-2fc8-42ae-b0e9-3556006a1f3b · outbound

This paper cites Szabó, P.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Szabó, P

Reference 24

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.690226Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.603754Z digest=sha256:c8179e6a0f609d4b2209aed17828bde2758407537ee047fb53f541fba18d7804

Observation ca6a4ca7-a93c-4785-8370-d0fa822ab9ca · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 25

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.678592Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.607309Z digest=sha256:432d44bace85ccd69d4a3543c1c8e1fca775a0718cd09f5a12d1dfa256ad5cff

Observation 5ac5b356-52b3-4610-9cbb-3d3677068f46 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 26

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.667404Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.611105Z digest=sha256:19f9686db284ed2d04603002dc4f8050f345bdd9f4272d1b0ef187a10d1e6116

Observation 818f8c8b-a07a-4f93-a7c1-1fa25d1d2cdf · outbound

This paper cites Chang, T.-H.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Chang, T.-H

Reference 27

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.657917Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.614818Z digest=sha256:5c59ff037d267d5e930c62fc03892de7b468c828681da830c0af219c5bec40a1

Observation ff0d01b3-006f-4671-9240-d2ddb124dfe3 · outbound

This paper cites Yanai, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Yanai, K

Reference 28

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.648083Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-13T06:32:02.005865+00:00.

source=pdf_text observed=2026-08-12T00:36:14.618207Z digest=sha256:3ca73b55de1caf0e5ac9d69b0248ff56cecd74e3bb5a79d41556f3edaca19519

Pith citing papers

No inbound Pith citation observations are available.