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Integrity report for Direct comparison of domain wall behavior in Permalloy nanowires patterned by electron beam lithography and focused ion beam milling

A machine-verified record of the checks Pith has run against this paper: detector runs, findings, signed bundle events, and canonical identifiers.

arXiv:1508.01910 · pith:2015:3JLJEHOW2WADRJGWY2ILK4XWLQ

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Paper page arXiv integrity.json bundle.json

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Signed record

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