Typed states for the displayed outbound observations.
Source: paper_references, paper_reference_links, observed 2026-08-15T14:55:21.775788Z
Paper Citation Record · LEDGER
As of 17 August 2026, this Paper Citation Record lists 26 of 26 outbound references and 0 inbound Pith citation observations for arXiv:2608.03078.
A citation records a reference. It does not transfer a finding from one paper to another.
Typed states for the displayed outbound observations.
Source: paper_references, paper_reference_links, observed 2026-08-15T14:55:21.775788Z
One-hop event checks from named stored sources.
Source: scholarly_work_events, retraction_status_cache, observed 2026-08-17T06:30:58.91139+00:00
Pith citing papers itemized under the disclosed page cap.
Source: paper_references, paper_reference_links
A source-named dated measurement, never combined with another source.
Source: cited_works
26 of 26 outbound references displayed
External citation measurements
No source-named external measurement is stored.
Observation 3b671c50-aa8c-461b-9c10-7eea14552e23 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Journal of Fuzzy Logic and Intelligent Systems , volume =
Reference 1
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 13f2eae1-9ec5-456f-b538-62102eaf07a9 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds 2017 30th IEEE International System-on-Chip Conference (SOCC) , pages =
Reference 2
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation ed9e21e8-77e9-4cb0-b08a-d83968f187d4 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Applied Sciences , volume =
Reference 3
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 38860290-b142-408f-9248-91f8a0efa6c6 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Metrology, Inspection, and Process Control XXXVI , volume =
Reference 4
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation b0758f2a-252a-4121-9ffd-bbb5ec1bd369 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Journal of Micro/Nanopatterning, Materials, and Metrology , volume =
Reference 5
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation b1ef3c15-735a-453c-9a46-66cbe2b7dfd5 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds 38th European Mask and Lithography Conference (EMLC 2023) , volume =
Reference 6
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation aa91b184-3e3d-4adc-8c9a-71b7bdc28958 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =
Reference 7
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 68e2eacf-4e6f-4e09-809e-5c5507bf4088 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Journal of Computer Vision , volume =
Reference 8
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 0960d7c2-656b-413c-8290-3828d1d98597 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds SPot-the-Difference Self-Supervised Pre-training for Anomaly Detection and Segmentation
Reference 9
Source-reported events for the cited work
Unavailable: canonical work link unavailable.
Observation fe559699-281c-44c0-a7b7-384887e75cc2 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , year =
Reference 10
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 76063931-1fec-449c-a9ed-1e197cedecf0 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Pattern Recognition
Reference 11
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 7f33466e-3b2c-4e3d-b255-a4f1e85e2ab2 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF International Conference on Computer Vision , pages =
Reference 12
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 73344078-d8eb-4271-b551-5b8e2f32a045 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =
Reference 13
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 1ca137a1-2a5b-4edc-924d-42db35b868a3 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Winter Conference on Applications of Computer Vision , pages =
Reference 14
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation a92d96c8-b979-49ed-a223-8f4673e1e6c3 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 38th International Conference on Machine Learning , volume =
Reference 15
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 7b398f19-e568-4c21-ada0-2e26cc9b3f19 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =
Reference 16
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation ed13a3ce-b108-4fba-8548-b8f57d7f22cf · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Conference on Learning Representations , year =
Reference 17
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation e13848bc-ee6a-46a9-b830-c12f2e4da4b4 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the AAAI Conference on Artificial Intelligence , volume =
Reference 18
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 78b93001-72d1-4b26-b049-52f712fc6a3f · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 32nd ACM International Conference on Multimedia , pages =
Reference 19
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation b7aee937-1aa1-481f-bfae-8b5a7703fd9e · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Conference on Learning Representations , year =
Reference 20
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation 8ad38380-9acd-4514-a68f-0439db4e372e · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Kosmos-2: Grounding Multimodal Large Language Models to the World
Reference 21
Source-reported events for the cited work
Unavailable: canonical work link unavailable.
Observation b5deea2e-ab00-49d6-967b-933e2b1b3d2a · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Shikra: Unleashing Multimodal LLM's Referential Dialogue Magic
Reference 22
Source-reported events for the cited work
Unavailable: canonical work link unavailable.
Observation dde9f6b7-7a81-44c0-8124-197b14ea987f · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Ferret: Refer and Ground Anything Anywhere at Any Granularity
Reference 23
Source-reported events for the cited work
Unavailable: canonical work link unavailable.
Observation 8e9581c4-c544-411b-be44-22dc011e1fe9 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 2023 Conference on Empirical Methods in Natural Language Processing , pages =
Reference 24
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
Observation bb798005-1e19-44ef-a6c9-83a01d16083c · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =
Reference 25
Source-reported events for the cited work
Unavailable: canonical work link unavailable.
Observation 4cb48f33-0546-46c8-98c8-d091ce085d82 · outbound
LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Educational and Psychological Measurement , volume =
Reference 26
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.
No inbound Pith citation observations are available.