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Paper Citation Record · LEDGER

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds

As of 17 August 2026, this Paper Citation Record lists 26 of 26 outbound references and 0 inbound Pith citation observations for arXiv:2608.03078.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2608.03078 v1

Coverage vector

measured 26 of 26 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-15T14:55:21.775788Z

measured 26 of 26 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-17T06:30:58.91139+00:00

measured 0 of 0 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

26 of 26 outbound references displayed

  • verified exact0
  • verified fuzzy21
  • unresolved5
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation 3b671c50-aa8c-461b-9c10-7eea14552e23 · outbound

This paper cites International Journal of Fuzzy Logic and Intelligent Systems , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Journal of Fuzzy Logic and Intelligent Systems , volume =

Reference 1

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.173258Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.657535Z digest=sha256:6b04e2a98084df8db62f17957638b4ebe07e33c9cfcaf35300e7bf79a7901613

Observation 13f2eae1-9ec5-456f-b538-62102eaf07a9 · outbound

This paper cites 2017 30th IEEE International System-on-Chip Conference (SOCC) , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds 2017 30th IEEE International System-on-Chip Conference (SOCC) , pages =

Reference 2

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.159572Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.662856Z digest=sha256:503b641fe51fb93dc8e1ab39b5ca1bb8bc07c775f029d03a5096127e3e220d42

Observation ed9e21e8-77e9-4cb0-b08a-d83968f187d4 · outbound

This paper cites Applied Sciences , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Applied Sciences , volume =

Reference 3

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.145714Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.668780Z digest=sha256:fcb02cd3353f48117a6330f793b84b892ad7721d1bbe54285d4d7da78a6bb69d

Observation 38860290-b142-408f-9248-91f8a0efa6c6 · outbound

This paper cites Metrology, Inspection, and Process Control XXXVI , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Metrology, Inspection, and Process Control XXXVI , volume =

Reference 4

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.131106Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.673398Z digest=sha256:62d50320643c76e121273c5be365ea135a6221a492ddabcb2bf75e07238e83b7

Observation b0758f2a-252a-4121-9ffd-bbb5ec1bd369 · outbound

This paper cites Journal of Micro/Nanopatterning, Materials, and Metrology , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Journal of Micro/Nanopatterning, Materials, and Metrology , volume =

Reference 5

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.117050Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.678156Z digest=sha256:4f0d7cb72fadf0533b7d41058b57bb373adf263a6266dc42ec16ade2e5b47adc

Observation b1ef3c15-735a-453c-9a46-66cbe2b7dfd5 · outbound

This paper cites 38th European Mask and Lithography Conference (EMLC 2023) , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds 38th European Mask and Lithography Conference (EMLC 2023) , volume =

Reference 6

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.102176Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.682593Z digest=sha256:17d68be298346c064a28fa09a4d2e8af7256bb1c092b3c566a9371f67653e0bd

Observation aa91b184-3e3d-4adc-8c9a-71b7bdc28958 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 7

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.088122Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.686954Z digest=sha256:8350619ae73d98baa9fe6f1fc0f71d650c0224ab399702d8615628b3c6c791f7

Observation 68e2eacf-4e6f-4e09-809e-5c5507bf4088 · outbound

This paper cites International Journal of Computer Vision , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Journal of Computer Vision , volume =

Reference 8

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.074675Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.691786Z digest=sha256:17f9bd5dcd537f311b2d0cc4318995107dc61d6cafa0819df18d678647680864

Observation 0960d7c2-656b-413c-8290-3828d1d98597 · outbound

This paper cites SPot-the-Difference Self-Supervised Pre-training for Anomaly Detection and Segmentation.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds SPot-the-Difference Self-Supervised Pre-training for Anomaly Detection and Segmentation

Reference 9

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.696337Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.696337Z digest=sha256:53ffa859c59b090bc4f3e4db29f23c232a77d7139e9717c3b465be2aa34aac50

Observation fe559699-281c-44c0-a7b7-384887e75cc2 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , year =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , year =

Reference 10

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.060659Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.701057Z digest=sha256:9896582489fef9602817e4eff0e3f78f36d2b389fdc71f7be5410c0ae4bb6ad1

Observation 76063931-1fec-449c-a9ed-1e197cedecf0 · outbound

This paper cites Pattern Recognition.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Pattern Recognition

Reference 11

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.047001Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.705286Z digest=sha256:7745a7bdf27fccf58ce351d2cd70976c066cdf7739da44a79bf89e35af67f56f

Observation 7f33466e-3b2c-4e3d-b255-a4f1e85e2ab2 · outbound

This paper cites Proceedings of the IEEE/CVF International Conference on Computer Vision , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF International Conference on Computer Vision , pages =

Reference 12

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.032727Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.709843Z digest=sha256:7e8619b99f39d44ca103edcc4d880b6f253e27c7af3010c07964ee4c41d9d155

Observation 73344078-d8eb-4271-b551-5b8e2f32a045 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 13

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.017897Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.714492Z digest=sha256:76659a42804d3f5f3ba54526deeda4615f91aaaf8a67389fd1f9f56402641798

Observation 1ca137a1-2a5b-4edc-924d-42db35b868a3 · outbound

This paper cites Proceedings of the IEEE/CVF Winter Conference on Applications of Computer Vision , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Winter Conference on Applications of Computer Vision , pages =

Reference 14

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.002432Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.718939Z digest=sha256:484f46cd72535b8da359e0fbb26de6837d883ec2183a09a6c8b2bb36701ed47e

Observation a92d96c8-b979-49ed-a223-8f4673e1e6c3 · outbound

This paper cites Proceedings of the 38th International Conference on Machine Learning , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 38th International Conference on Machine Learning , volume =

Reference 15

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.987694Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.723380Z digest=sha256:64d7aaf4a59038da0ab40b0d3cf973230e6215806c419c18c0eeb446df41339a

Observation 7b398f19-e568-4c21-ada0-2e26cc9b3f19 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 16

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.972098Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.728045Z digest=sha256:7ad9dfdf23d8149e1aa03494014b2ca91a8606b2c1d5f3768471bf0faf994a56

Observation ed13a3ce-b108-4fba-8548-b8f57d7f22cf · outbound

This paper cites International Conference on Learning Representations , year =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Conference on Learning Representations , year =

Reference 17

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.956349Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.732722Z digest=sha256:9506a64cfbb174729232c461e81520e8082df874c8b36119a727fbd6f7c7c302

Observation e13848bc-ee6a-46a9-b830-c12f2e4da4b4 · outbound

This paper cites Proceedings of the AAAI Conference on Artificial Intelligence , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the AAAI Conference on Artificial Intelligence , volume =

Reference 18

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.941116Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.737396Z digest=sha256:47e19150113b4cf20fda2825b5fd5d00e8376166060f12c22c80db612876390a

Observation 78b93001-72d1-4b26-b049-52f712fc6a3f · outbound

This paper cites Proceedings of the 32nd ACM International Conference on Multimedia , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 32nd ACM International Conference on Multimedia , pages =

Reference 19

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.926749Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.742312Z digest=sha256:5eea7f661fe73f312cbf5832d8abcb9d1a955ceb146e85776282ce707c6ad3de

Observation b7aee937-1aa1-481f-bfae-8b5a7703fd9e · outbound

This paper cites International Conference on Learning Representations , year =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Conference on Learning Representations , year =

Reference 20

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.912470Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.747306Z digest=sha256:464e6d484492b3dab6081f784b28b63280f2b2278359d1e12748327498b456df

Observation 8ad38380-9acd-4514-a68f-0439db4e372e · outbound

This paper cites Kosmos-2: Grounding Multimodal Large Language Models to the World.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Kosmos-2: Grounding Multimodal Large Language Models to the World

Reference 21

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.752461Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.752461Z digest=sha256:eeb5514660586cbb8a5ebb1f2033a4916df8cb796d27433d456640729156cf15

Observation b5deea2e-ab00-49d6-967b-933e2b1b3d2a · outbound

This paper cites Shikra: Unleashing Multimodal LLM's Referential Dialogue Magic.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Shikra: Unleashing Multimodal LLM's Referential Dialogue Magic

Reference 22

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.757198Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.757198Z digest=sha256:4daeddcf3847caf0e8670f516d0dd212ff2182808bfa70df3cdeb18c570f2788

Observation dde9f6b7-7a81-44c0-8124-197b14ea987f · outbound

This paper cites Ferret: Refer and Ground Anything Anywhere at Any Granularity.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Ferret: Refer and Ground Anything Anywhere at Any Granularity

Reference 23

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.761651Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.761651Z digest=sha256:b4c2354e24ea2915cf0afa4b09331f95cbb9064eb617ca035780d19ab98d3820

Observation 8e9581c4-c544-411b-be44-22dc011e1fe9 · outbound

This paper cites Proceedings of the 2023 Conference on Empirical Methods in Natural Language Processing , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 2023 Conference on Empirical Methods in Natural Language Processing , pages =

Reference 24

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.897273Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.766382Z digest=sha256:3ba9f80f6115c6a575bab962bebdc80ed049d31784ae09536fa50f3155414507

Observation bb798005-1e19-44ef-a6c9-83a01d16083c · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 25

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.771420Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.771420Z digest=sha256:83deabb3e48106bd68d807f4eff36a73c259cad1f92d23f466830b98bfb68968

Observation 4cb48f33-0546-46c8-98c8-d091ce085d82 · outbound

This paper cites Educational and Psychological Measurement , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Educational and Psychological Measurement , volume =

Reference 26

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.872356Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.775788Z digest=sha256:7c541bdcf8f3be9cde86f5fe3a67fb2e32dd225a294bc370260dd8d3f89993a4

Pith citing papers

No inbound Pith citation observations are available.