Paper Citation Record · LEDGER

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM

As of 9 August 2026, this Paper Citation Record lists 43 of 43 outbound references and 0 inbound Pith citation observations for arXiv:2502.09031.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2502.09031 v1

Coverage vector

measured 43 of 43 reference resolution

Typed states for the displayed outbound observations.

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One-hop event checks from named stored sources.

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Pith citing papers itemized under the disclosed page cap.

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A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

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External citation measurements

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Outbound references

Observation eff34f95-f71f-45f2-a918-8a76da51f700 · outbound

This paper cites the internet of things.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM the internet of things

Reference 1

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This paper cites & Rydning, J.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Rydning, J

Reference 2

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This paper cites an unresolved cited work.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

Reference 3

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This paper cites & Takeo, A.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Takeo, A

Reference 4

Resolution: verified exact; arxiv_id_nonexistent, observed 2026-08-07T22:58:11.133176Z

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This paper cites & Santos, T.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Santos, T

Reference 5

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.993704Z

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This paper cites & Gangopadhyay, S.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Gangopadhyay, S

Reference 6

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.982068Z

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This paper cites C., Tyndall, G.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM C., Tyndall, G

Reference 7

Resolution: verified exact; arxiv_id_nonexistent, observed 2026-08-07T22:58:10.914041Z

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This paper cites & Raman, V.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Raman, V

Reference 8

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.971652Z

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This paper cites & Polycarpou, A.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Polycarpou, A

Reference 9

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This paper cites & Polycarpou, A.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Polycarpou, A

Reference 10

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.961026Z

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This paper cites & Hono, K.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Hono, K

Reference 11

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.948678Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

Reference 12

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.937768Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

Reference 13

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.927746Z

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This paper cites & Panjan, M.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Panjan, M

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Resolution: verified exact; doi, observed 2026-08-07T22:58:09.916103Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Kim, C.-I

Reference 15

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.905317Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

Reference 16

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM P .et al

Reference 17

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This paper cites Visualization and analysis of atomistic simu lation data with ovito-the open visualization tool.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Visualization and analysis of atomistic simu lation data with ovito-the open visualization tool

Reference 18

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Izumi, F

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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This paper cites an unresolved cited work.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Wang, J.-P

Reference 23

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.852976Z

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This paper cites & Wang, J.-P.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Wang, J.-P

Reference 24

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.840971Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Resolution: verified exact; doi, observed 2026-08-07T22:58:09.829846Z

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This paper cites J., Humbird, D.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM J., Humbird, D

Reference 26

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.819205Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Lee, B.-J

Reference 29

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.790849Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM S., Tucker, O

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Resolution: verified exact; doi, observed 2026-08-07T22:58:09.779409Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Ziegler, J. F. & Biersack, J. P

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM R., Humbird, D

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Ono, K

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

Reference 34

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.744911Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Stoneham, A

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Observation 86b28139-1ab0-4e23-9cdc-fc083726a20d · outbound

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Resolution: verified exact; doi, observed 2026-08-07T22:58:09.718119Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM P ., Domínguez-Gutiérrez, F

Reference 37

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.705670Z

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correction dated 2020-02-05. Source: crossref record 10.1038/s41598-020-59350-3->10.1038/s41598-019-38941-9:correction, observed 2026-07-11T02:56:54.190607+00:00. This notice travels one citation hop only.

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Bijkerk, F

Reference 39

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM U., Isobe, M., Karahashi, K

Reference 40

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Theory of sputtering

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Panjan, M

Reference 42

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Eckstein, W

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