Paper Citation Record · LEDGER

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM

As of 23 August 2026, this Paper Citation Record lists 43 of 43 outbound references and 0 inbound Pith citation observations for arXiv:2502.09031.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2502.09031 v1

Coverage vector

measured 43 of 43 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-07T22:58:09.625936Z

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One-hop event checks from named stored sources.

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Pith citing papers itemized under the disclosed page cap.

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A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

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External citation measurements

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Outbound references

Observation eff34f95-f71f-45f2-a918-8a76da51f700 · outbound

This paper cites the internet of things.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM the internet of things

Reference 1

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Observation 835e2629-bc35-4f8b-a9d0-e92a8b3071a0 · outbound

This paper cites & Rydning, J.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Rydning, J

Reference 2

Resolution: verified fuzzy; raw_fallback, observed 2026-08-07T22:58:11.329395Z

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This paper cites an unresolved cited work.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

Reference 3

Resolution: unresolved; raw_fallback, observed 2026-08-07T22:58:11.319681Z

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This paper cites & Takeo, A.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Takeo, A

Reference 4

Resolution: verified exact; arxiv_id_nonexistent, observed 2026-08-07T22:58:11.133176Z

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This paper cites & Santos, T.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Santos, T

Reference 5

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.993704Z

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Observation e0b81114-841a-4a1e-b0e1-498b7175b2a0 · outbound

This paper cites & Gangopadhyay, S.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Gangopadhyay, S

Reference 6

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.982068Z

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This paper cites C., Tyndall, G.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM C., Tyndall, G

Reference 7

Resolution: verified exact; arxiv_id_nonexistent, observed 2026-08-07T22:58:10.914041Z

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This paper cites & Raman, V.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Raman, V

Reference 8

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.971652Z

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This paper cites & Polycarpou, A.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Polycarpou, A

Reference 9

Resolution: verified exact; arxiv_id_nonexistent, observed 2026-08-07T22:58:10.744048Z

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This paper cites & Polycarpou, A.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Polycarpou, A

Reference 10

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.961026Z

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No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

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This paper cites & Hono, K.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Hono, K

Reference 11

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.948678Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

Reference 12

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.937768Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

Reference 13

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.927746Z

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This paper cites & Panjan, M.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Panjan, M

Reference 14

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.916103Z

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This paper cites & Kim, C.-I.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Kim, C.-I

Reference 15

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.905317Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

Reference 16

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM P .et al

Reference 17

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This paper cites Visualization and analysis of atomistic simu lation data with ovito-the open visualization tool.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Visualization and analysis of atomistic simu lation data with ovito-the open visualization tool

Reference 18

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Izumi, F

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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This paper cites an unresolved cited work.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Resolution: verified exact; doi, observed 2026-08-07T22:58:09.873206Z

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This paper cites an unresolved cited work.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Wang, J.-P

Reference 23

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.852976Z

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This paper cites & Wang, J.-P.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Wang, J.-P

Reference 24

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.840971Z

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No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

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This paper cites an unresolved cited work.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Resolution: verified exact; doi, observed 2026-08-07T22:58:09.829846Z

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No event found in the named queried sources as of 2026-08-23T06:30:58.430688+00:00.

Observation 4b56971f-2bbf-4e89-9780-f578456b15ef · outbound

This paper cites J., Humbird, D.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM J., Humbird, D

Reference 26

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.819205Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Resolution: verified exact; doi, observed 2026-08-07T22:58:09.808690Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Lee, B.-J

Reference 29

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.790849Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM S., Tucker, O

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Resolution: verified exact; doi, observed 2026-08-07T22:58:09.779409Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Ziegler, J. F. & Biersack, J. P

Reference 31

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM R., Humbird, D

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Ono, K

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

Reference 34

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.744911Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Stoneham, A

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Observation 86b28139-1ab0-4e23-9cdc-fc083726a20d · outbound

This paper cites an unresolved cited work.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Resolution: verified exact; doi, observed 2026-08-07T22:58:09.718119Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM P ., Domínguez-Gutiérrez, F

Reference 37

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.705670Z

Source-reported events for the cited work

correction dated 2020-02-05. Source: crossref record 10.1038/s41598-020-59350-3->10.1038/s41598-019-38941-9:correction, observed 2026-07-11T02:56:54.190607+00:00. This notice travels one citation hop only.

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Unresolved cited work

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Bijkerk, F

Reference 39

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM U., Isobe, M., Karahashi, K

Reference 40

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.681841Z

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM Theory of sputtering

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Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Panjan, M

Reference 42

Resolution: verified exact; doi, observed 2026-08-07T22:58:09.659562Z

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This paper cites & Eckstein, W.

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM & Eckstein, W

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Pith citing papers

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