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Integrity report for Chemical Vapor Deposition Growth of Monolayer WSe2 with Tunable Device Characteristics and Growth Mechanism Study

A machine-verified record of the checks Pith has run against this paper: detector runs, findings, signed bundle events, and canonical identifiers.

arXiv:1505.04706 · pith:2015:BHE67LRAIQ3QFUTP3J3HPCHDQO

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Paper page arXiv integrity.json bundle.json

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Signed record

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