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Paper Citation Record · LEDGER

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions

As of 13 August 2026, this Paper Citation Record lists 28 of 28 outbound references and 0 inbound Pith citation observations for arXiv:2608.08031.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2608.08031 v1

Coverage vector

measured 28 of 28 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-12T00:36:14.618207Z

measured 28 of 28 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-12T06:34:41.77262+00:00

measured 0 of 0 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

28 of 28 outbound references displayed

  • verified exact0
  • verified fuzzy13
  • unresolved15
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation ccfb7891-e8ef-49a9-96ad-6419e7063b5c · outbound

This paper cites Abe, Y.Sonobe, and T.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Abe, Y.Sonobe, and T

Reference 1

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.909964Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.520738Z digest=sha256:ebd3af567ab6dd04338f47141fd7d49c580a76a6d3f7889e8762d404e265bfd8

Observation 48a9934b-32ca-470f-89a5-209da6d7f35e · outbound

This paper cites Hosokawa, R.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Hosokawa, R

Reference 2

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.900726Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.525588Z digest=sha256:cd469173ddfbd0fade302b0d8570c800639d03772da62db844b3ada2253ad2d1

Observation d20b3557-5087-4608-a417-68e582709931 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 3

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.891706Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.529397Z digest=sha256:3df6995cbf8f5bc6356525386e4110de51142eb2ef8812b6589a13fdc92fe564

Observation 3321b74e-070f-4262-9400-c8b584c18b34 · outbound

This paper cites Holland, and S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Holland, and S

Reference 4

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.882897Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.533653Z digest=sha256:150db560a72ff03bed37456265177b760f66e5310a813959e16e7b29ad2ef5c0

Observation 3e5091d9-b6c5-4b33-8be5-5dd7db6cf36f · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 5

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.873770Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.537925Z digest=sha256:40849cd127fa6b3b1f75323d2a96729c3d4a715b6a458cac24b173d6eaf46751

Observation 5c0b9888-8206-408c-a904-2e5300b4ea60 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 6

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.864943Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.542073Z digest=sha256:b378bb3a0e94f2d65acdb63bb01eb0c89b2f1c531b54e8ac29e6bbb3850895cc

Observation aca3addb-206e-4e84-8bc3-67f8c5032e09 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 7

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.855850Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.546115Z digest=sha256:5509f8363a654e304ceedcbb24aa34678d775a58a4f438134e566f560141a859

Observation 58cce227-adcb-42f1-931b-608086ea17d3 · outbound

This paper cites K., Song I.-C., Lu S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions K., Song I.-C., Lu S

Reference 8

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.846510Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.549906Z digest=sha256:d7c7275eac126dcb414690494b5ad3585f70a1a59cc457ec09a3312fbb74de62

Observation 9ee41961-cf89-4ab8-8180-fc196b3d9ecf · outbound

This paper cites and Lill T.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions and Lill T

Reference 9

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.837484Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.553475Z digest=sha256:d29ea91bef71138cfffe6aed12cddcf7efda11ee64d0bd2f9f572a6980d86026

Observation 0707c76a-3a2b-4f6b-b15f-c59d33e79f77 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 10

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.828069Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.556702Z digest=sha256:0be13bf0d67180f8c97295612100a1d8c1e5e8a99859f39da8a5ef98af7a3ff9

Observation 9b397afe-6d8f-48db-a2c4-44b7608d7d9e · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 11

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.819269Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.559885Z digest=sha256:671689735cf8a45f90bbfbcf08e8723b6d017e4b5950fc0367bfad7f1dcd098b

Observation 1d083fb2-f8cc-43ee-ab6e-3b55370a3a29 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 12

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.809953Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.563347Z digest=sha256:975ba0ae32b923ea219c9b6524054fe4bd0082d1377dc90c14cccaec4c656c84

Observation 665d2e67-53ac-465e-8fed-f42704e1b270 · outbound

This paper cites Tachi, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Tachi, K

Reference 13

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.801035Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.566625Z digest=sha256:869a97eef26a360ffa608012b6c0b4d5183feeed56f75388f14f7f426b09f198

Observation c9984631-9f8d-442e-97c5-849f4374bc14 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 14

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.792683Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.569923Z digest=sha256:f2ebb73b996434e15575d4b017e69d52571dc619ccd89a83daf55af9486b14f1

Observation 605f413c-66a2-4f3b-b428-7f49e0046282 · outbound

This paper cites Karahashi, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, K

Reference 15

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.784057Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.573345Z digest=sha256:5b37d642106fcbd7f1c3d4e3fc149e89186bc1a8c2210e96b17f205d6beff321

Observation 4b58c1ae-2798-44c6-ac1d-d8c4cbf6a414 · outbound

This paper cites Karahashi, and S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, and S

Reference 16

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.773962Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.576507Z digest=sha256:9c0a1399a678c347229d86d93fd63aacbbab3d7e6fb27e09e23c2bfec9e711b4

Observation 5cba6fc6-dfad-4074-af30-c2d36ed99e73 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 17

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.764636Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.579640Z digest=sha256:122660206047ae0989f68a87643ff04bc90a9f98ead1cf8b82e4ca12b7794adc

Observation 70511fbb-d1e8-4491-8157-6e570225f465 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 18

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.754542Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.583233Z digest=sha256:e373f965c780378456e7c6b30322831dc37e338f23d86606d2737315ab77fdb5

Observation fc77de31-f03a-4844-8e58-56a654ec70fb · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 19

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.744927Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.586396Z digest=sha256:a44129f33f45319e2bea6a1973d4ae65c9cf3252a5254e7c36e9019257ec5334

Observation 320aa820-613f-4ea6-9002-3bb98604d875 · outbound

This paper cites Karahashi, J.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, J

Reference 20

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.735610Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.589628Z digest=sha256:0bc587447c65c1d791e76513321b6ebad2c52081599ba6ef0ec24098993accac

Observation bbd81f71-efe8-46aa-b09f-5099eb3c8e07 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 21

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.725114Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.592861Z digest=sha256:62665a49a77d49c2cc7b8a615c947152e78e7d2c2cefba4b7899322053389642

Observation 0f6a3650-74eb-4f33-a3ff-30cf8a323ac7 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 22

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.714947Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.596750Z digest=sha256:c6e72dfdbfa2c84bb2a9247553f63a1521009b248ca122df2f6ebb6d8f0cd148

Observation 62c89377-ab02-4b73-a9b9-a4bbb33f7db9 · outbound

This paper cites Karahashi, J.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, J

Reference 23

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.703032Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.600333Z digest=sha256:33c81fa3e2047677eb644c07270baf6dbf7825990919f88ad67af4c1005ad371

Observation dbf877d8-2fc8-42ae-b0e9-3556006a1f3b · outbound

This paper cites Szabó, P.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Szabó, P

Reference 24

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.690226Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.603754Z digest=sha256:c9f3df8f05eb9b02a5d520888d43713e0149a456bcefa777ddabf07449fb63be

Observation ca6a4ca7-a93c-4785-8370-d0fa822ab9ca · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 25

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.678592Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.607309Z digest=sha256:de18b1522149c4178a6382c6283e41fc7136e196eacd36ba586077c691991879

Observation 5ac5b356-52b3-4610-9cbb-3d3677068f46 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 26

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.667404Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.611105Z digest=sha256:1d69551efda84a89071c624d1359432252962744b2051edf06c6c77116a3b1b1

Observation 818f8c8b-a07a-4f93-a7c1-1fa25d1d2cdf · outbound

This paper cites Chang, T.-H.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Chang, T.-H

Reference 27

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.657917Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.614818Z digest=sha256:fdcf916b597b6c916b2242ad07dbd98fe1f90f8898439d7d6d9478c6a447bb4d

Observation ff0d01b3-006f-4671-9240-d2ddb124dfe3 · outbound

This paper cites Yanai, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Yanai, K

Reference 28

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.648083Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-12T06:34:41.77262+00:00.

source=pdf_text observed=2026-08-12T00:36:14.618207Z digest=sha256:8fc215d02be2a1f9712342112a948a87f645f51392b9130b244d404d25a73073

Pith citing papers

No inbound Pith citation observations are available.