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Paper Citation Record · LEDGER

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions

As of 18 August 2026, this Paper Citation Record lists 28 of 28 outbound references and 0 inbound Pith citation observations for arXiv:2608.08031.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2608.08031 v1

Coverage vector

measured 28 of 28 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-12T00:36:14.618207Z

measured 28 of 28 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-17T06:30:58.91139+00:00

measured 0 of 0 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

28 of 28 outbound references displayed

  • verified exact0
  • verified fuzzy13
  • unresolved15
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation ccfb7891-e8ef-49a9-96ad-6419e7063b5c · outbound

This paper cites Abe, Y.Sonobe, and T.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Abe, Y.Sonobe, and T

Reference 1

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.909964Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.520738Z digest=sha256:4a775ed757ef0e2548e732339876013a96e0a3e107f92ff7fa53baa2a94221b8

Observation 48a9934b-32ca-470f-89a5-209da6d7f35e · outbound

This paper cites Hosokawa, R.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Hosokawa, R

Reference 2

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.900726Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.525588Z digest=sha256:b7888bd0ddea3264307a25bf4d5d0e62efdf30b07f2c88bdaa731d74b68bd096

Observation d20b3557-5087-4608-a417-68e582709931 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 3

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.891706Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.529397Z digest=sha256:876f50ce2fd3ff8fb8104847d881c22f944578c9d38ff6d881816f2c6a17b382

Observation 3321b74e-070f-4262-9400-c8b584c18b34 · outbound

This paper cites Holland, and S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Holland, and S

Reference 4

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.882897Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.533653Z digest=sha256:287e3f93bb4180f52859afe5c2d47dca59253db24b0f26129e18bdba69f3583d

Observation 3e5091d9-b6c5-4b33-8be5-5dd7db6cf36f · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 5

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.873770Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.537925Z digest=sha256:f0234c756b1ac91336e3a5323bd1f0f70d3a2a2fdd70020b455a47b73c6c65ba

Observation 5c0b9888-8206-408c-a904-2e5300b4ea60 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 6

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.864943Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.542073Z digest=sha256:c5be948a2911f1af3c5198f5d45559f8b5f664705633f6ec7ed6a58f5102127f

Observation aca3addb-206e-4e84-8bc3-67f8c5032e09 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 7

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.855850Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.546115Z digest=sha256:1d83ff1b2cbcf92d981b9bf000e237cf817e4a5ee4b236849e9edd73c9df5067

Observation 58cce227-adcb-42f1-931b-608086ea17d3 · outbound

This paper cites K., Song I.-C., Lu S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions K., Song I.-C., Lu S

Reference 8

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.846510Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.549906Z digest=sha256:67f248e828d604260dc577a4ce6ca02261c4d1c4868dfc53b91d2bf6825a1daf

Observation 9ee41961-cf89-4ab8-8180-fc196b3d9ecf · outbound

This paper cites and Lill T.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions and Lill T

Reference 9

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.837484Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.553475Z digest=sha256:54c632dcb88b7917fe138e5060a5abc47e54532ca15452defe66afaef58d8107

Observation 0707c76a-3a2b-4f6b-b15f-c59d33e79f77 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 10

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.828069Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.556702Z digest=sha256:529f23229a46739bdb594fbb92c2181371da63432b6916a367c8d805e8be0909

Observation 9b397afe-6d8f-48db-a2c4-44b7608d7d9e · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 11

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.819269Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.559885Z digest=sha256:c2a74cc4f12ba65f50fb3d3d08d6577af5064f831601f9a0c3b7b0e80efebdba

Observation 1d083fb2-f8cc-43ee-ab6e-3b55370a3a29 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 12

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.809953Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.563347Z digest=sha256:581d83582b6951b8f2a7aa72593749d006892f966100388d6bd1a8f7a26cc4bd

Observation 665d2e67-53ac-465e-8fed-f42704e1b270 · outbound

This paper cites Tachi, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Tachi, K

Reference 13

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.801035Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.566625Z digest=sha256:eec89e682279f170aaf1a16d5f2ceada014e77427631a9622c523a5d0a242538

Observation c9984631-9f8d-442e-97c5-849f4374bc14 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 14

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.792683Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.569923Z digest=sha256:8ab10f11ce2ea5d15e7215e0b2097767e6cefc4a7b8fc315396f79a6a84d8dbb

Observation 605f413c-66a2-4f3b-b428-7f49e0046282 · outbound

This paper cites Karahashi, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, K

Reference 15

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.784057Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.573345Z digest=sha256:06fa69e3f6c4cce6b120fb0cbd709ba89a8c3f05a628bca1345fb1326500c6cd

Observation 4b58c1ae-2798-44c6-ac1d-d8c4cbf6a414 · outbound

This paper cites Karahashi, and S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, and S

Reference 16

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.773962Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.576507Z digest=sha256:78fd8b06ecd7c0890a54c5c99d09e0f12374ac8e2c07818873aceaf24d30c2e1

Observation 5cba6fc6-dfad-4074-af30-c2d36ed99e73 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 17

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.764636Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.579640Z digest=sha256:526b94a6a14c17b6858b3ac88831b260258684571ae1e9ddbc0edc70836d85fc

Observation 70511fbb-d1e8-4491-8157-6e570225f465 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 18

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.754542Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.583233Z digest=sha256:ef19438ead726eba4da356630611c936f482a140ae39913e583e8809aa44789d

Observation fc77de31-f03a-4844-8e58-56a654ec70fb · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 19

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.744927Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.586396Z digest=sha256:5c868d7753ada224538001f50dc5a9f29cb078eccbd9b89ac1c5e098f30bdc4e

Observation 320aa820-613f-4ea6-9002-3bb98604d875 · outbound

This paper cites Karahashi, J.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, J

Reference 20

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.735610Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.589628Z digest=sha256:76f14c2e665e6836cbfc868479f569c7331b6d256330b4d90747efd9c7fc9e17

Observation bbd81f71-efe8-46aa-b09f-5099eb3c8e07 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 21

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.725114Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.592861Z digest=sha256:921e646a10dd88de00fe3de1a63c5aa1a3bda906669462247c99bf8a7c367a0d

Observation 0f6a3650-74eb-4f33-a3ff-30cf8a323ac7 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 22

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.714947Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.596750Z digest=sha256:03a6105644d939c3a82674dde2b38ab2bde36f55a14f662b4d0b17723c352e4f

Observation 62c89377-ab02-4b73-a9b9-a4bbb33f7db9 · outbound

This paper cites Karahashi, J.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, J

Reference 23

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.703032Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.600333Z digest=sha256:980e9fb41f609fc3f5d65f4ae0fbe17d497ec28bada9bca8f0dc4f33d21815fc

Observation dbf877d8-2fc8-42ae-b0e9-3556006a1f3b · outbound

This paper cites Szabó, P.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Szabó, P

Reference 24

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.690226Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.603754Z digest=sha256:e17c41b922bbdb6a05b5ed46efcca456ababaf609a67d67a817b6c7b9aff253c

Observation ca6a4ca7-a93c-4785-8370-d0fa822ab9ca · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 25

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.678592Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.607309Z digest=sha256:2fa8de5164d53174c277420a14af5840d7c0b7198abacffef079b7bb45287943

Observation 5ac5b356-52b3-4610-9cbb-3d3677068f46 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 26

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.667404Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.611105Z digest=sha256:fb84832c82643115493092a7c326e0df58541fc32c59044b9f891b2aed6adfda

Observation 818f8c8b-a07a-4f93-a7c1-1fa25d1d2cdf · outbound

This paper cites Chang, T.-H.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Chang, T.-H

Reference 27

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.657917Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.614818Z digest=sha256:950e7bd9ae2f4e21a67268fb5f3c41bd2b1dab439e074338408d7d67a8ec1e56

Observation ff0d01b3-006f-4671-9240-d2ddb124dfe3 · outbound

This paper cites Yanai, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Yanai, K

Reference 28

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.648083Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=pdf_text observed=2026-08-12T00:36:14.618207Z digest=sha256:301a3bb479a0d7990b3eca4582d3c3b616d281f6662f4c23c949f7fa23b12164

Pith citing papers

No inbound Pith citation observations are available.