Integrity report for Overcoming contact resistance at metal-2D semiconductor interfaces: atomically clean MoS2/Au ohmic junctions

A machine-verified record of the checks Pith has run against this paper: detector runs, findings, signed bundle events, and canonical identifiers.

arXiv:2605.27187 · pith:2026:FQK2EEIP6WV33U5MFT7STYYFHH

0Critical

0Advisory

6Detectors run

2026-06-03Last checked

Paper page arXiv integrity.json bundle.json

Detector runs

ai_meta_artifact skipped v1.0.0 · findings 0 · 2026-06-03 03:35:24.694322+00:00

claim_evidence completed v1.0.0 · findings 0 · 2026-06-01 09:47:16.403408+00:00

external_links completed v1.0.0 · findings 0 · 2026-05-27 23:31:52.708198+00:00

shingle_duplication skipped v0.1.0 · findings 0 · 2026-05-27 17:49:59.458589+00:00

citation_quote_validity skipped v0.1.0 · findings 0 · 2026-05-27 07:50:19.790339+00:00

cited_work_retraction completed v1.0.0 · findings 0 · 2026-05-27 05:23:36.715637+00:00

Findings

No public integrity findings for this paper.

Signed record

The machine-readable record for this paper lives at /pith/FQK2EEIP/integrity.json. Pith Number bundles also include signed pith.integrity.v1 events where a Pith Number exists.