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Paper Citation Record · LEDGER

Atomic Layer Etching of Aluminum Nitride: Mechanistic Insights from First-Principles Studies of Chlorine Chemistry

As of 16 August 2026, this Paper Citation Record lists 6 of 6 outbound references and 0 inbound Pith citation observations for arXiv:2509.07554.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2509.07554 v1

Coverage vector

measured 6 of 6 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-15T16:17:05.596052Z

measured 6 of 6 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-16T06:30:59.297886+00:00

measured 0 of 0 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

6 of 6 outbound references displayed

  • verified exact0
  • verified fuzzy3
  • unresolved3
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation 8b81a628-d7bd-4d32-ad6a-e3f1d19c7760 · outbound

This paper cites Once the gas is adsorbed on the surface it chemically modifies the top atomic layer s.

Atomic Layer Etching of Aluminum Nitride: Mechanistic Insights from First-Principles Studies of Chlorine Chemistry Once the gas is adsorbed on the surface it chemically modifies the top atomic layer s

Reference 1

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:17:05.723554Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-16T06:30:59.297886+00:00.

source=pdf_text observed=2026-08-15T16:17:05.565790Z digest=sha256:bf33908b3b54d65f07480509239012880a14435d2a6d066e8ded0bcbc3e7bda8

Observation 41d3d264-da48-4546-9dc9-fe9fe98b0562 · outbound

This paper cites Ar, to remove the unreacted reaction byproducts from the surface.

Atomic Layer Etching of Aluminum Nitride: Mechanistic Insights from First-Principles Studies of Chlorine Chemistry Ar, to remove the unreacted reaction byproducts from the surface

Reference 2

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:17:05.705733Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-16T06:30:59.297886+00:00.

source=pdf_text observed=2026-08-15T16:17:05.572446Z digest=sha256:688a94d99d44f6c0f43648713a39fa49a4feb1b9c94148860ea866c798bd52ba

Observation bfbee63b-8970-4c8c-98b2-efc937f2ff50 · outbound

This paper cites an unresolved cited work.

Atomic Layer Etching of Aluminum Nitride: Mechanistic Insights from First-Principles Studies of Chlorine Chemistry Unresolved cited work

Reference 3

Resolution
unresolved
raw_fallback, observed 2026-08-15T16:17:05.687398Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-16T06:30:59.297886+00:00.

source=pdf_text observed=2026-08-15T16:17:05.577577Z digest=sha256:da935b5e2d4efe6960b2e3171acca35d1c420e66674ab7df1afb0094c11e23fa

Observation ce17a294-6543-469b-aea4-4fc58ad03fa6 · outbound

This paper cites an unresolved cited work.

Atomic Layer Etching of Aluminum Nitride: Mechanistic Insights from First-Principles Studies of Chlorine Chemistry Unresolved cited work

Reference 4

Resolution
unresolved
raw_fallback, observed 2026-08-15T16:17:05.670351Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-16T06:30:59.297886+00:00.

source=pdf_text observed=2026-08-15T16:17:05.582808Z digest=sha256:1cebfdc0593478e1b66b611a3c720c09024812573e789485ad3c72c59030e0cd

Observation 93dba767-901c-42fb-a0c5-eb1ff062dfea · outbound

This paper cites an unresolved cited work.

Atomic Layer Etching of Aluminum Nitride: Mechanistic Insights from First-Principles Studies of Chlorine Chemistry Unresolved cited work

Reference 5

Resolution
unresolved
raw_fallback, observed 2026-08-15T16:17:05.653019Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-16T06:30:59.297886+00:00.

source=pdf_text observed=2026-08-15T16:17:05.588984Z digest=sha256:eea9b654e43a7e0224e79a23e5a8b38815ff3de21602dc21fa3b6c6fa0a4328d

Observation 7e343cd2-cf02-4e9b-87c1-7a5972a06976 · outbound

This paper cites Fundamentals of atomic and close-to-atomic scale manufacturing: a review,.

Atomic Layer Etching of Aluminum Nitride: Mechanistic Insights from First-Principles Studies of Chlorine Chemistry Fundamentals of atomic and close-to-atomic scale manufacturing: a review,

Reference 6

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:17:05.636128Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-16T06:30:59.297886+00:00.

source=pdf_text observed=2026-08-15T16:17:05.596052Z digest=sha256:cb5ccf44cb3c5b3155230476756c1d39177ed70f857525712044a929a42a1922

Pith citing papers

No inbound Pith citation observations are available.