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Integrity report for Annealing shallow Si/SiO₂ interface traps in electron-beam irradiated high-mobility metal-oxide-silicon transistors

A machine-verified record of the checks Pith has run against this paper: detector runs, findings, signed bundle events, and canonical identifiers.

arXiv:1612.08729 · pith:2016:IONWERWYV35NSNJ6VT6BREN6SS

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Paper page arXiv integrity.json bundle.json

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Signed record

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