REVIEW
Low-threshold whispering-gallery-mode microlasers fabricated in a Nd: glass substrate by three-dimensional femtosecond laser micromachining
Not yet reviewed by Pith; the record is open.
This paper has not been read by Pith yet. Machine review is queued; the pith claim, tier, and objections will appear here once it completes.
SPECIMEN: schema-true, not a live event
T0 review · schema-true
One-sentence machine reading of the paper's core claim.
pith:XXXXXXXX · record.json · timestamp
read the original abstract
We report on fabrication of whispering-gallery-mode microlasers in a Nd:glass chip by femtosecond laser three-dimensional (3D) micromachining. Main fabrication procedures include the fabrication of freestanding microdisks supported by thin pillars by femtosecond laser ablation of the glass substrate immersed in water, followed by CO2 laser annealing for surface smoothing. Lasing is observed at a pump threshold as low as ~69 {\mu}W at room temperature with a continuous-wave laser diode operating at 780nm. This technique allows for fabrication of microcavities of high quality factors in various dielectric materials such as glasses and crystals.
Discussion (0). Sign in to comment.