Pith. sign in

Paper Citation Record · LEDGER

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity

As of 22 August 2026, this Paper Citation Record lists 52 of 52 outbound references and 1 inbound Pith citation observation for arXiv:2509.07045.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2509.07045 v1

Coverage vector

measured 52 of 52 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-15T16:19:18.358267Z

measured 53 of 53 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-22T06:32:14.747728+00:00

measured 1 of 1 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links, observed 2026-05-09T18:45:07.928250Z

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: arxiv_reference, observed 2026-05-11T16:06:16.432289Z

Reference resolution

52 of 52 outbound references displayed

  • verified exact0
  • verified fuzzy51
  • unresolved1
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation 2591cc88-b2db-4788-b2fa-1474a2bd1c58 · outbound

This paper cites Nonvolatile Memory Materials for Neuromorphic Intelligent Machines,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Nonvolatile Memory Materials for Neuromorphic Intelligent Machines,

Reference 1

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:19.090388Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.138376Z digest=sha256:553acf2176aec80720cd0147bf9165f21f93b02a9b1836e69c2e7f03caed51f2

Observation 1a29d49b-ee88-4fe5-9283-721bb5086132 · outbound

This paper cites Pathways to efficient neuromorphic computing with non-volatile memory technologies,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Pathways to efficient neuromorphic computing with non-volatile memory technologies,

Reference 2

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:19.075587Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.146200Z digest=sha256:3c6df240e41507f705247e5842aac21b1f8ba04339821546d713ddaac86668b3

Observation 3495ca8f-5e44-4811-a1b8-49efea091cd9 · outbound

This paper cites Flexible Neuromorphic Electronics for Computing, Soft Robotics, and Neuroprosthetics,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Flexible Neuromorphic Electronics for Computing, Soft Robotics, and Neuroprosthetics,

Reference 3

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:19.060742Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.151617Z digest=sha256:621fdc12de74c933f0b32ceb69bced747db551e7e033c3968780f898687d32ce

Observation c32608e5-7e5d-4d98-8f0a-7fa4ef438393 · outbound

This paper cites Compact artificial neuron based on anti-ferroelectric transistor,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Compact artificial neuron based on anti-ferroelectric transistor,

Reference 4

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:19.048020Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.156908Z digest=sha256:d1c5572df63d41f95d09078f2d83b5c311487e001706bc5105f9c68031b46b83

Observation e6e3eb6a-bd34-4e4c-877b-fb55e6470738 · outbound

This paper cites Back -End CMOS Compatible and Flexible Ferroelectric Memories for Neuromorphic Computing and Adaptive Sensing,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Back -End CMOS Compatible and Flexible Ferroelectric Memories for Neuromorphic Computing and Adaptive Sensing,

Reference 5

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verified fuzzy
raw_fallback, observed 2026-08-15T16:19:19.034388Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.161676Z digest=sha256:3e90266c5f2152c8c84d782afc20f53bdce23e1817c7250d6b08de0e13c8924c

Observation 4bd07d71-afc0-43a9-8124-3b520b588869 · outbound

This paper cites Harnessing ferroic ordering in thin film devices for analog memory and neuromorphic computing applications down to deep cryogenic temperatures,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Harnessing ferroic ordering in thin film devices for analog memory and neuromorphic computing applications down to deep cryogenic temperatures,

Reference 6

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:19.020009Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.165852Z digest=sha256:a73b281bc24651f7044d884ba83460a348a023e98149cd53c734cbde1e6d7c2b

Observation 4d9eeaec-1491-4fa0-ac0e-04ef75e58025 · outbound

This paper cites Physical Mechanisms behind the Field- Cycling Behavior of HfO2 -Based Ferroelectric Capacitors,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Physical Mechanisms behind the Field- Cycling Behavior of HfO2 -Based Ferroelectric Capacitors,

Reference 7

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verified fuzzy
raw_fallback, observed 2026-08-15T16:19:19.007040Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.170076Z digest=sha256:9ee22c2053ec8a2b041dce8ff80f29d6a92d1cff85ca33f36ce0e5aa29942d3b

Observation 109bec4f-f66f-4b3f-bd05-0fb4ada35d8d · outbound

This paper cites Ferroelectric FET analog synapse for acceleration of deep neural network training.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Ferroelectric FET analog synapse for acceleration of deep neural network training

Reference 8

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.993671Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.173909Z digest=sha256:6a0ff698c7e51141b03715cb2b1016904cc05959149f6afd332209894b1f2701

Observation 05fcb991-df45-4c53-b3f7-339d6621b284 · outbound

This paper cites Toprasertpong, K.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Toprasertpong, K

Reference 9

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.979701Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.178272Z digest=sha256:c23bcfc40bc7fbf510c124e5a03e3c6a05973b5da26108194181a00e563b9aa4

Observation 0788a704-cba6-41b0-b1ab-0f2672e208d2 · outbound

This paper cites Investigation of Recovery Phenomena in Hf0.5Zr0.5O2-Based 1T1C FeRAM.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Investigation of Recovery Phenomena in Hf0.5Zr0.5O2-Based 1T1C FeRAM

Reference 10

Resolution
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raw_fallback, observed 2026-08-15T16:19:18.966125Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.182569Z digest=sha256:832a6883867020b1a0af2fe5a8d8d9e615f7f06ac897cbd41dcf4a04c3d82f56

Observation a50a4eb1-cf1d-46f1-b685-c2f7a662bf99 · outbound

This paper cites an unresolved cited work.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Unresolved cited work

Reference 11

Resolution
unresolved
raw_fallback, observed 2026-08-15T16:19:18.952640Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.186347Z digest=sha256:97459f97bd3f6ab2023283ff13e955376e568fd14ab754af80a0556ab9027b77

Observation 2943c132-1141-4406-abdc-7b8badb01ea4 · outbound

This paper cites Ferroelectricity in Simple Binary ZrO2 and HfO2,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Ferroelectricity in Simple Binary ZrO2 and HfO2,

Reference 12

Resolution
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raw_fallback, observed 2026-08-15T16:19:18.937673Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.190318Z digest=sha256:315680121ea195f5faf94dd6ef63f90935a0fff0abf42942a45accaeb3d639e4

Observation 75555b94-a576-4b24-a541-877488cc919c · outbound

This paper cites Cryogenic Endurance of Anti-ferroelectric and Ferroelectric Hf1−xZrxO2 for Quantum Computing Applications.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Cryogenic Endurance of Anti-ferroelectric and Ferroelectric Hf1−xZrxO2 for Quantum Computing Applications

Reference 13

Resolution
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raw_fallback, observed 2026-08-15T16:19:18.922987Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.195810Z digest=sha256:7170d2b4eb3d4738aee378fcd208c65c091b7edf551b5fdf3f9d40c334866f68

Observation 17b79e1e-4761-4f5b-be52-628e83b2d1db · outbound

This paper cites Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature,

Reference 14

Resolution
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raw_fallback, observed 2026-08-15T16:19:18.910305Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.200348Z digest=sha256:8f157c3a9757d4972da296c3a42f4c5219beca921def27dd9e8986300f1238e8

Observation 768d2371-42b4-4e98-8401-ad141bdfdc9c · outbound

This paper cites Effect of Process Temperature on Density and Electrical Characteristics of Hf0.5Zr0.5O2 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Effect of Process Temperature on Density and Electrical Characteristics of Hf0.5Zr0.5O2 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition,

Reference 15

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raw_fallback, observed 2026-08-15T16:19:18.890073Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.204539Z digest=sha256:237a5676fd01865be5afb6bbbd0d75c292791e2eff7033f971c5ce70a7f9593b

Observation 7d3d69ad-d252-476e-98b4-d999246990a3 · outbound

This paper cites Large Remnant Polarization in a Wake-Up Free Hf0.5Zr0.5O2 Ferroelectric Film through Bulk and Interface Engineering,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Large Remnant Polarization in a Wake-Up Free Hf0.5Zr0.5O2 Ferroelectric Film through Bulk and Interface Engineering,

Reference 16

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raw_fallback, observed 2026-08-15T16:19:18.876400Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.208838Z digest=sha256:2e03871cb892bebc2d4c103e9c928acf4e93ae4d8e1a40908d0737a800fec104

Observation 17d5a65d-6592-4cca-8822-e2d0846bbd46 · outbound

This paper cites A Study on Imprint Behavior of Ferroelectric Hafnium Oxide Caused by High-Temperature Annealing,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity A Study on Imprint Behavior of Ferroelectric Hafnium Oxide Caused by High-Temperature Annealing,

Reference 17

Resolution
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raw_fallback, observed 2026-08-15T16:19:18.862951Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.216096Z digest=sha256:afe891835cad81f497c82c440ca073476c14a12baf08dba6d447edce186def28

Observation 767a76d9-6b83-484f-b876-86fd689d1bd6 · outbound

This paper cites Enhanced Endurance and Imprint Properties in Hf 0.5 Zr 0.5 O 2−δ Ferroelectric Capacitors by Tailoring the Oxygen Vacancy,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Enhanced Endurance and Imprint Properties in Hf 0.5 Zr 0.5 O 2−δ Ferroelectric Capacitors by Tailoring the Oxygen Vacancy,

Reference 18

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raw_fallback, observed 2026-08-15T16:19:18.849460Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.220478Z digest=sha256:e44a022d72c88024c56f169ec87dc6aa9b41985977d11954a463ce0fc92eb5fd

Observation 2735a2a1-2daf-4180-b3ad-80c01f635490 · outbound

This paper cites Ferroelectric [HfO2 /ZrO2 ] Superlattices with Enhanced Polarization, Tailored Coercive Field, and Improved High Temperature Reliability,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Ferroelectric [HfO2 /ZrO2 ] Superlattices with Enhanced Polarization, Tailored Coercive Field, and Improved High Temperature Reliability,

Reference 19

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raw_fallback, observed 2026-08-15T16:19:18.834881Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.224918Z digest=sha256:404e3c9c9c9a99ecebaecabcaae2e1c6fa50ca1f6addf623f7b3082e783c0170

Observation 0e921fa2-7749-4661-b0ea-baa9e92f6550 · outbound

This paper cites Low Voltage High Polarization by Optimizing Scavenged WNx Interfacial Capping Layer at the Ru/HfxZr1-xO2 Interface and Evidence of Fatigue Mechanism,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Low Voltage High Polarization by Optimizing Scavenged WNx Interfacial Capping Layer at the Ru/HfxZr1-xO2 Interface and Evidence of Fatigue Mechanism,

Reference 20

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.820448Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.229090Z digest=sha256:c54c998324f9664e71270d6888178ced784e783169005c3e3505f9b2612808f7

Observation ef87754d-a320-46e5-9d3b-1518c9b05d32 · outbound

This paper cites Ferroelectric Hf0.5Zr0.5O2 for Analog Memory and In-Memory Computing Applications Down to Deep Cryogenic Temperatures,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Ferroelectric Hf0.5Zr0.5O2 for Analog Memory and In-Memory Computing Applications Down to Deep Cryogenic Temperatures,

Reference 21

Resolution
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raw_fallback, observed 2026-08-15T16:19:18.799017Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.233435Z digest=sha256:df59d59b8406554a1a5e230d97a0b027a629a37c41d3138ba040853eb7c5756f

Observation dbc1e706-8291-46a8-895e-f6d86096a699 · outbound

This paper cites Understanding fatigue and recovery mechanisms in Hf0.5Zr0.5O2 capacitors for designing high endurance ferroelectric memory and neuromorphic hardware,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Understanding fatigue and recovery mechanisms in Hf0.5Zr0.5O2 capacitors for designing high endurance ferroelectric memory and neuromorphic hardware,

Reference 22

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.783804Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.237821Z digest=sha256:3c6287e28423ad4ef985a8bfaeffd314aaa940eb4ca6f4a99a19e5734122f024

Observation d3a386f4-6546-4ce2-9dce-247c0194785b · outbound

This paper cites ZrO2-HfO2 superlattice ferroelectric capacitors with optimized annealing to achieve extremely high polarization stability.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity ZrO2-HfO2 superlattice ferroelectric capacitors with optimized annealing to achieve extremely high polarization stability

Reference 23

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.768491Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.242204Z digest=sha256:721df40217e0534abf99c153cec7188114c02726573651e4bcaf7eb2da217699

Observation ed2570a7-540f-447e-a46e-636899f2f0a3 · outbound

This paper cites Superlattice HfO2-ZrO2 based Ferro-Stack HfZrO2 FeFETs: Homogeneous-Domain Merits Ultra-Low Error, Low Programming Voltage 4 V and Robust Endurance 109 cycles for Multibit NVM.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Superlattice HfO2-ZrO2 based Ferro-Stack HfZrO2 FeFETs: Homogeneous-Domain Merits Ultra-Low Error, Low Programming Voltage 4 V and Robust Endurance 109 cycles for Multibit NVM

Reference 24

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.753092Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.246624Z digest=sha256:ccdf5e643757c08ad13df48c1921fed396c7413baa5b081130aea0c9441b79ac

Observation c0d29807-2871-4a21-9db3-099376a23ec3 · outbound

This paper cites Enhancing ferroelectric stability: wide-range of adaptive control in epitaxial HfO2/ZrO2 superlattices,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Enhancing ferroelectric stability: wide-range of adaptive control in epitaxial HfO2/ZrO2 superlattices,

Reference 25

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.735864Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.250909Z digest=sha256:34ee8aca6c35fa395865a3cce9b8d923d69915d9626b062eee4f0c75402093af

Observation 34ebcad8-ab5c-4fec-b073-aedc85722ce5 · outbound

This paper cites Wake-up effects in Si-doped hafnium oxide ferroelectric thin films,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Wake-up effects in Si-doped hafnium oxide ferroelectric thin films,

Reference 26

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.720897Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.255336Z digest=sha256:31ee4e98ab2aaaaa9236b998c0d1b619af0ffb62b0663bce17c05d806c4fe705

Observation 212759d4-7127-4438-840c-d28a3d3be01b · outbound

This paper cites Back -End-of-Line Compatible Low- Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Back -End-of-Line Compatible Low- Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation,

Reference 27

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.705208Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.259634Z digest=sha256:7c2bb0e654750c9b5f58de3dbdcd246b75bbd938a35619e6727e7a587a4a37fa

Observation 22d211e5-e961-478b-9dd1-a76767bc2d2b · outbound

This paper cites HfO2-ZrO2 Ferroelectric Capacitors with Superlattice Structure: Improving Fatigue Stability, Fatigue Recovery, and Switching Speed,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity HfO2-ZrO2 Ferroelectric Capacitors with Superlattice Structure: Improving Fatigue Stability, Fatigue Recovery, and Switching Speed,

Reference 28

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.690020Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.263950Z digest=sha256:af665419d7ee959c9666f859fc1c8b19d92174be2d2d8f46a6b68129575b089b

Observation ec68f8e8-4e33-486c-a380-4ebfb9034089 · outbound

This paper cites Back-End-of-Line Compatible HfO2/ZrO2 Superlattice Ferroelectric Capacitor With TiO2 Seed Layer for Enhanced Ferroelectricity.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Back-End-of-Line Compatible HfO2/ZrO2 Superlattice Ferroelectric Capacitor With TiO2 Seed Layer for Enhanced Ferroelectricity

Reference 29

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.673765Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.267479Z digest=sha256:f3c8b6913e6121923c88def2da05949e319b434ab5e0853704da2eb50e646b4f

Observation 3cfbc9f2-1575-48a2-8dfd-e50a3d55b737 · outbound

This paper cites Antiferroelectricity in thin-film ZrO2 from first principles,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Antiferroelectricity in thin-film ZrO2 from first principles,

Reference 30

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.662128Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.271866Z digest=sha256:e036f1dc97b6769b9720c408b1064635a7020fbd886a45e25197671b537cc6cf

Observation 1d9d4b99-eb62-439c-b2e5-f9427cf8be84 · outbound

This paper cites Structural Changes Underlying Field - Cycling Phenomena in Ferroelectric HfO2 Thin Films,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Structural Changes Underlying Field - Cycling Phenomena in Ferroelectric HfO2 Thin Films,

Reference 31

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.649915Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.275605Z digest=sha256:9a462fbefb0d4277f7488adfd5f38c82c4414eb36c78ca90a0d0166466869d0d

Observation 2b588ba7-1bc4-47ac-86c2-40a791e0455f · outbound

This paper cites Improved ferroelectric properties of CMOS back-end- of-line compatible Hf0.5Zr0.5O2 thin films by introducing dielectric layers,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Improved ferroelectric properties of CMOS back-end- of-line compatible Hf0.5Zr0.5O2 thin films by introducing dielectric layers,

Reference 32

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.636040Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.279605Z digest=sha256:a2c17c1ef2642573b00cb6cb5456ce2f77457c6282ea882e5a6ffeb664d392e5

Observation 703d6cef-6607-4412-8d7e-6c8d71d48aa1 · outbound

This paper cites Large remnant polarization and great reliability characteristics in W/HZO/W ferroelectric capacitors,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Large remnant polarization and great reliability characteristics in W/HZO/W ferroelectric capacitors,

Reference 33

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.622881Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.283329Z digest=sha256:18d41bcece429190fee46803e1f4ed2d6410d6e524c9990adb3dde59494e5ca8

Observation 6c9ecd5f-5812-48dc-9992-4c9697da8cf2 · outbound

This paper cites Investigating charge trapping in ferroelectric thin films through transient measurements,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Investigating charge trapping in ferroelectric thin films through transient measurements,

Reference 34

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.611296Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.287182Z digest=sha256:778ec075737cec9409e8c35b7e699165de0cd63a43337fc9323207bab36e6b36

Observation 686150da-90b6-4548-8c19-ed64db922562 · outbound

This paper cites Large ferroelectric polarization of TiN/Hf0.5Zr0.5O2/TiN capacitors due to stress-induced crystallization at low thermal budget,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Large ferroelectric polarization of TiN/Hf0.5Zr0.5O2/TiN capacitors due to stress-induced crystallization at low thermal budget,

Reference 35

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.599899Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.291502Z digest=sha256:c9cc66cddcf308f6bd5bff603ba9083d2f8252d97338f0dbb7d31c578def56ce

Observation 0bf3563e-21c6-4eae-9499-0d8adbab27a9 · outbound

This paper cites Review on the Microstructure of Ferroelectric Hafnium Oxides,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Review on the Microstructure of Ferroelectric Hafnium Oxides,

Reference 36

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.587989Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.295829Z digest=sha256:9f57d999c8cf47f6047238255487c73e008fe22cc2eee48643a06781de6a2256

Observation 939eec3b-8a76-46c1-a736-0d51ef89d601 · outbound

This paper cites Reversible transition between the polar and antipolar phases and its implications for wake-up and fatigue in HfO2-based ferroelectric thin film,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Reversible transition between the polar and antipolar phases and its implications for wake-up and fatigue in HfO2-based ferroelectric thin film,

Reference 37

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.575271Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.301228Z digest=sha256:d583d5ad896443bad9083089df17bf5f7d3769508d9cf04aa351c872895c727c

Observation 729eeef1-5172-4217-9886-19573f81d820 · outbound

This paper cites Ferroelectric Hf1-xZrxO 2 memories: device reliability and depolarization fields.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Ferroelectric Hf1-xZrxO 2 memories: device reliability and depolarization fields

Reference 38

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.561379Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.305366Z digest=sha256:3a21f0e6e4c6f05d696ebd71b4beea84e60a306d21cc283fe5db3138a768d6ea

Observation 045e3e8a-46a6-4efc-bf2e-8f9e4349d888 · outbound

This paper cites Interface-induced phenomena in polarization response of ferroelectric thin films,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Interface-induced phenomena in polarization response of ferroelectric thin films,

Reference 39

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.549063Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.309462Z digest=sha256:beb9988ae8a5b30fb1d49e0d0e9184394b8b0e9f62b3b11418c664b3ca409b8c

Observation 77bdbf98-31fc-44cd-a8cb-57d01ecdc35c · outbound

This paper cites Strategies for Reducing Operating Voltage of Ferroelectric Hafnia by Decreasing Coercive Field and Film Thickness,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Strategies for Reducing Operating Voltage of Ferroelectric Hafnia by Decreasing Coercive Field and Film Thickness,

Reference 40

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.537634Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.313076Z digest=sha256:3822678084185249b13e5de7de6518c296889fdc1a33cec8bcffeac562048559

Observation 37060e22-37a8-4a88-8316-64cccb4be44b · outbound

This paper cites Reduced coercive field and enhanced ferroelectric polarization of Hf0. 5Zr0. 5O2 film through electric-field-assisted rapid annealing.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Reduced coercive field and enhanced ferroelectric polarization of Hf0. 5Zr0. 5O2 film through electric-field-assisted rapid annealing

Reference 41

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.526838Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.316764Z digest=sha256:2fbaf744e3db2b84005cbffa98b4a5fc4203640dd8e42b205b07f737cf0ac1fc

Observation 12589d28-0044-47bc-afdd-34bd5ac301f0 · outbound

This paper cites Engineering Hf 0.5 Zr 0.5 O 2 ferroelectric tunnel junctions with amorphous WO x bottom electrodes achieving high remanent polarization and record low- operating voltage.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Engineering Hf 0.5 Zr 0.5 O 2 ferroelectric tunnel junctions with amorphous WO x bottom electrodes achieving high remanent polarization and record low- operating voltage

Reference 42

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.516415Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.320337Z digest=sha256:d60de9772d05c1a8169829971fd326fa6efb3e95d95904787e64d79413e953bf

Observation 41a549fd-dd01-4a98-b7c2-328ddf3d31c7 · outbound

This paper cites Effect of Thermal Engineering on the Reliability of Analog States in Ferroelectric Hf0.5Zr0.5O2 Memory.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Effect of Thermal Engineering on the Reliability of Analog States in Ferroelectric Hf0.5Zr0.5O2 Memory

Reference 43

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.504516Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.323815Z digest=sha256:a2d1ab9cbe0e5492458099bf12852e00880acacebcd3edfc92094fb9533fed9b

Observation 61fa5141-e451-47b2-9e06-8d87da1dd7b7 · outbound

This paper cites Electric -Field-Induced Ferroelectricity in 5%Y-doped Hf0.5Zr0.5O2 : Transformation from the Paraelectric Tetragonal Phase to the Ferroelectric Orthorhombic Phase,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Electric -Field-Induced Ferroelectricity in 5%Y-doped Hf0.5Zr0.5O2 : Transformation from the Paraelectric Tetragonal Phase to the Ferroelectric Orthorhombic Phase,

Reference 44

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.492978Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.327617Z digest=sha256:a0ece25518f970889beae2271f839e4c6e1ecff2ebbcbaf46a4e5d96865f91fe

Observation dfd613ca-f62e-4f32-ae10-f28acdd20d11 · outbound

This paper cites Comprehensive Study on the Kinetic Formation of the Orthorhombic Ferroelectric Phase in Epitaxial Y-Doped Ferroelectric HfO2 Thin Films,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Comprehensive Study on the Kinetic Formation of the Orthorhombic Ferroelectric Phase in Epitaxial Y-Doped Ferroelectric HfO2 Thin Films,

Reference 45

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.480861Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.331206Z digest=sha256:93e1d1e0539b4db0486f10a03e85e4c0bc3e030397cfe347ef2dde7de0b3f189

Observation d9846f22-be6a-42d8-bd8c-e922f532ffb3 · outbound

This paper cites Observation and characterization of recoverable fatigue process under low-electric field (< 1.8 MV/cm) in HfZrO ferroelectric film.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Observation and characterization of recoverable fatigue process under low-electric field (< 1.8 MV/cm) in HfZrO ferroelectric film

Reference 46

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.467100Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.335602Z digest=sha256:1b16e0dcce1e5d48b6b682616bfb5092260afbe4e02c50911b7f5cdd7216be2b

Observation c7763611-a44c-428d-b2f6-6f5bab32f336 · outbound

This paper cites Enhanced performance of hafnia self-rectifying ferroelectric tunnel junctions at cryogenic temperatures,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Enhanced performance of hafnia self-rectifying ferroelectric tunnel junctions at cryogenic temperatures,

Reference 47

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.454057Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.339933Z digest=sha256:eb6216730a798ade7619d08ec581a3880a6f20850dc46cda1cabc0b21833b77e

Observation a82dd196-1b25-41f0-a052-ca7542889140 · outbound

This paper cites Temperature-dependent defect behaviors in ferroelectric Hf0.5Zr0.5O2 thin film: Re-wakeup phenomenon and underlying mechanisms.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Temperature-dependent defect behaviors in ferroelectric Hf0.5Zr0.5O2 thin film: Re-wakeup phenomenon and underlying mechanisms

Reference 48

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.439605Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.344143Z digest=sha256:e3e2503bb7ef26e657207497561ecc4dda330d56147e294c80d448a04be031e3

Observation ca613c4a-90f9-4b44-8d6e-c60a2e53189e · outbound

This paper cites Involvement of Unsaturated Switching in the Endurance Cycling of Si-doped HfO2 Ferroelectric Thin Films,.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Involvement of Unsaturated Switching in the Endurance Cycling of Si-doped HfO2 Ferroelectric Thin Films,

Reference 49

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.427001Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.347715Z digest=sha256:d94a56aa7edeace9c29067f2633e4a99987b20805e4ba070b98e75f7cdec70af

Observation 7d6958ab-b50e-4f08-a419-7018252078e1 · outbound

This paper cites Resistive switching in all‐ oxide ferroelectric tunnel junctions with ionic interfaces.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Resistive switching in all‐ oxide ferroelectric tunnel junctions with ionic interfaces

Reference 50

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.414853Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.351215Z digest=sha256:1ea4890ddfab264e8233d1d3213580948eacfc91e28f5f35812e7f1d78bdc660

Observation ca3fb706-5bee-429e-b694-c730b717c0d9 · outbound

This paper cites Mimicking Neurotransmitter Release and Long‐ Term Plasticity by Oxygen Vacancy Migration in a Tunnel Junction Memristor.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Mimicking Neurotransmitter Release and Long‐ Term Plasticity by Oxygen Vacancy Migration in a Tunnel Junction Memristor

Reference 51

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.402936Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.354764Z digest=sha256:7ebab8bc2142c265ab5f85e7730dfc68bafc4fc511267c1c7ece65ce2f0c1641

Observation 3c77e2b2-17f4-447f-938d-7f9e0cf2fa71 · outbound

This paper cites Majumdar, H.

Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity Majumdar, H

Reference 52

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T16:19:18.390116Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-08-15T16:19:18.358267Z digest=sha256:09ba46009915475955312fff52370537afa8dcedd1e40891ba913a4d29202c33

Pith citing papers

Observation 37ab2a4d-4f00-4262-9ae7-44e58398b9c3 · inbound

An Unsupervised Machine Learning-based Framework for Wafer Scale Variability Analysis and Performance Prediction of Ferroelectric Hf0.5Zr0.5O2 Thin Film Capacitors cites this paper.

An Unsupervised Machine Learning-based Framework for Wafer Scale Variability Analysis and Performance Prediction of Ferroelectric Hf0.5Zr0.5O2 Thin Film Capacitors Record High Polarization at 2V and Imprint-free operation in Superlattice HfO2-ZrO2 by Proper Tuning of Ferro and Antiferroelectricity

Reference 26

Resolution
verified exact
arxiv_id, observed 2026-05-11T16:06:16.479874Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-22T06:32:14.747728+00:00.

source=pdf_text observed=2026-05-09T18:45:07.928250Z digest=sha256:8c1951453c078bee511e5276f7cf9a829cbce7ed0339945044fcc3c6381f003a