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pith:STPTC473

pith:2026:STPTC473DWHPPVHLFPOXVT3MRI
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Resist-free shadow deposition using silicon trenches for Josephson junctions in superconducting qubits

Judy J. Cha, Saswata Roy, Stephen Daniel Funni, Tathagata Banerjee, Valla Fatemi

Resist-free shadow deposition with silicon trenches fabricates Josephson junctions achieving 184 microsecond relaxation times.

arxiv:2604.09796 v2 · 2026-04-10 · quant-ph · physics.app-ph

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Claims

C1strongest claim

We fabricate Al-AlOx-Al JJs and qubits using this method, measuring median energy relaxation times up to 184 microseconds with minimal contamination at the substrate-metal interface.

C2weakest assumption

The silicon trench geometry provides reliable shadowing and junction formation equivalent to or better than resist-based methods without introducing new defects or scalability limits; this premise is invoked when claiming the approach is CMOS compatible and easily integrated into existing qubit fabrication flows.

C3one line summary

Resist-free shadow deposition via etched silicon trenches produces Al-AlOx-Al Josephson junctions with median qubit energy relaxation times of 184 microseconds and minimal substrate-metal interface contamination.

References

47 extracted · 47 resolved · 1 Pith anchors

[1] V. V. Sivak, A. Eickbusch, B. Royer, S. Singh, I. Tsiout- sios, S. Ganjam, A. Miano, B. L. Brock, A. Z. Ding, L. Frunzio, S. M. Girvin, R. J. Schoelkopf, and M. H. Devoret, Nature616, 50 (2023) 2023
[2] Google Quantum AI and Collaborators, Nature638, 920 (2025) 2025
[3] M. W. Olszewski, L. Kong, S. Reinhardt, D. Tong, X. Du, G. D. Gianluca, H. Lu, S. Roy, L. Zhang, A. B. Biedron, D. A. Muller, and V. Fatemi, Krypton-sputtered tanta- lum films for scalable high-perfor 2026
[4] M. Tuokkola, Y. Sunada, H. Kivij¨ arvi, J. Albanese, L. Gr¨ onberg, J.-P. Kaikkonen, V. Vesterinen, J. Gove- nius, and M. M¨ ott¨ onen, Nature Communications16, 5421 (2025) 2025
[5] M. A. Gingras, B. M. Niedzielski, K. A. Grossklaus, D. Miller, F. Contipelli, K. Azar, L. D. Burkhart, G. Calu- sine, D. Davis, R. D. Pi˜ nero, J. M. Gertler, T. M. Hazard, C. F. Hirjibehedin, D. K. K 2025
Receipt and verification
First computed 2026-05-20T00:01:41.272525Z
Builder pith-number-builder-2026-05-17-v1
Signature Pith Ed25519 (pith-v1-2026-05) · public key
Schema pith-number/v1.0

Canonical hash

94df3173fb1d8ef7d4eb2bdd7acf6c8a205438923f598ef1d1c0272a664aeb19

Aliases

arxiv: 2604.09796 · arxiv_version: 2604.09796v2 · doi: 10.48550/arxiv.2604.09796 · pith_short_12: STPTC473DWHP · pith_short_16: STPTC473DWHPPVHL · pith_short_8: STPTC473
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Verify this Pith Number yourself
curl -sH 'Accept: application/ld+json' https://pith.science/pith/STPTC473DWHPPVHLFPOXVT3MRI \
  | jq -c '.canonical_record' \
  | python3 -c "import sys,json,hashlib; b=json.dumps(json.loads(sys.stdin.read()), sort_keys=True, separators=(',',':'), ensure_ascii=False).encode(); print(hashlib.sha256(b).hexdigest())"
# expect: 94df3173fb1d8ef7d4eb2bdd7acf6c8a205438923f598ef1d1c0272a664aeb19
Canonical record JSON
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    "license": "http://creativecommons.org/licenses/by/4.0/",
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