pith:STPTC473
Resist-free shadow deposition using silicon trenches for Josephson junctions in superconducting qubits
Resist-free shadow deposition with silicon trenches fabricates Josephson junctions achieving 184 microsecond relaxation times.
arxiv:2604.09796 v2 · 2026-04-10 · quant-ph · physics.app-ph
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Claims
We fabricate Al-AlOx-Al JJs and qubits using this method, measuring median energy relaxation times up to 184 microseconds with minimal contamination at the substrate-metal interface.
The silicon trench geometry provides reliable shadowing and junction formation equivalent to or better than resist-based methods without introducing new defects or scalability limits; this premise is invoked when claiming the approach is CMOS compatible and easily integrated into existing qubit fabrication flows.
Resist-free shadow deposition via etched silicon trenches produces Al-AlOx-Al Josephson junctions with median qubit energy relaxation times of 184 microseconds and minimal substrate-metal interface contamination.
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| First computed | 2026-05-20T00:01:41.272525Z |
|---|---|
| Builder | pith-number-builder-2026-05-17-v1 |
| Signature | Pith Ed25519
(pith-v1-2026-05) · public key |
| Schema | pith-number/v1.0 |
Canonical hash
94df3173fb1d8ef7d4eb2bdd7acf6c8a205438923f598ef1d1c0272a664aeb19
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· · · · ·Agent API
Verify this Pith Number yourself
curl -sH 'Accept: application/ld+json' https://pith.science/pith/STPTC473DWHPPVHLFPOXVT3MRI \
| jq -c '.canonical_record' \
| python3 -c "import sys,json,hashlib; b=json.dumps(json.loads(sys.stdin.read()), sort_keys=True, separators=(',',':'), ensure_ascii=False).encode(); print(hashlib.sha256(b).hexdigest())"
# expect: 94df3173fb1d8ef7d4eb2bdd7acf6c8a205438923f598ef1d1c0272a664aeb19
Canonical record JSON
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