pith. sign in

C. Laubis

Identifiers

  • name variant C. Laubis 0.60 · backfill

Papers (3)

  1. Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations physics.optics · 2011 · author #6
  2. Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis physics.optics · 2010 · author #5
  3. Rigorous FEM-Simulation of EUV-Masks: Influence of Shape and Material Parameters physics.optics · 2006 · author #6

Mentions

  • 1110.4760 #6 · backfill · confidence 0.70 C. Laubis
  • 1011.2665 #5 · backfill · confidence 0.70 C. Laubis

Frequent Coauthors