Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations
classification
⚛️ physics.optics
physics.comp-ph
keywords
numericalsimulationsexperimentalmaskspatternsperformedresultsscatterometry
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EUV scatterometry is performed on 3D patterns on EUV lithography masks. Numerical simulations of the experimental setup are performed using a rigorous Maxwell solver. Mask geometry is determined by minimizing the difference between experimental results and numerical results for varied geometrical input parameters for the simulations.
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