Electron-beam irradiation of polystyrene in ambient gas enables tunable fluorescence from 451 to 544 nm, with up to 18 times brighter emission under helium compared to high vacuum.
Polystyrene negative resist for high-resolution electron beam lithography
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Enhanced Patterned Fluorescence from Polystyrene through Focused Electron Beam Irradiation under Various Gases
Electron-beam irradiation of polystyrene in ambient gas enables tunable fluorescence from 451 to 544 nm, with up to 18 times brighter emission under helium compared to high vacuum.