Polycrystalline ε-FeSi thin films exhibit intrinsic anomalous Hall effect from Berry phase and Weyl semimetal chiral anomaly signatures, with estimated Weyl point separation of 0.36.
von Goldbeck, Fe—Si Iron—Silicon
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Experimental Signatures of Topological Transport in Polycrystalline FeSi Thin Films
Polycrystalline ε-FeSi thin films exhibit intrinsic anomalous Hall effect from Berry phase and Weyl semimetal chiral anomaly signatures, with estimated Weyl point separation of 0.36.