KPFM shows work function rising with layer number in MoS2 bilayers, with larger differences in AB stacking due to stronger interlayer coupling, plus n-type photogating from substrate effects and surface traps.
Unveiling the correlation between defects and high mobility in mos2 monolayers.ACS Applied Materials & Interfaces, 17(7):10942–10953
1 Pith paper cite this work. Polarity classification is still indexing.
1
Pith paper citing it
fields
cond-mat.mes-hall 1years
2026 1verdicts
UNVERDICTED 1representative citing papers
citing papers explorer
-
Nanoscale mapping of stacking-dependent work function and local photoresponse in CVD-grown MoS2 bilayers by KPFM
KPFM shows work function rising with layer number in MoS2 bilayers, with larger differences in AB stacking due to stronger interlayer coupling, plus n-type photogating from substrate effects and surface traps.