Resist-free shadow deposition via etched silicon trenches produces Al-AlOx-Al Josephson junctions with median qubit energy relaxation times of 184 microseconds and minimal substrate-metal interface contamination.
Wang,Fabrication stability of Josephson junctions for superconducting qubits, Ph.D
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Resist-free shadow deposition using silicon trenches for Josephson junctions in superconducting qubits
Resist-free shadow deposition via etched silicon trenches produces Al-AlOx-Al Josephson junctions with median qubit energy relaxation times of 184 microseconds and minimal substrate-metal interface contamination.