Resist-free shadow deposition via etched silicon trenches produces Al-AlOx-Al Josephson junctions with median qubit energy relaxation times of 184 microseconds and minimal substrate-metal interface contamination.
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XPS evaluation of 17 capping layers identifies resilient options that limit niobium oxidation during standard fabrication and improve microwave resonator performance.
citing papers explorer
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Resist-free shadow deposition using silicon trenches for Josephson junctions in superconducting qubits
Resist-free shadow deposition via etched silicon trenches produces Al-AlOx-Al Josephson junctions with median qubit energy relaxation times of 184 microseconds and minimal substrate-metal interface contamination.
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Fabrication effects on Niobium oxidation and surface contamination in Niobium-metal bilayers using X-ray photoelectron spectroscopy
XPS evaluation of 17 capping layers identifies resilient options that limit niobium oxidation during standard fabrication and improve microwave resonator performance.