TAB microscopy exploits the steep power-law response of photon-avalanching materials to amplify sample attenuation and narrow the effective excitation spot, giving label-free far-field images with reported sub-diffraction features down to roughly 50 to 70 nm.
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Label free sub-diffraction imaging using non-linear photon avalanche backlight
TAB microscopy exploits the steep power-law response of photon-avalanching materials to amplify sample attenuation and narrow the effective excitation spot, giving label-free far-field images with reported sub-diffraction features down to roughly 50 to 70 nm.