A U-Net trained on CAD layouts and flawed wafer photos can generate defect-free synthetic wafer images that serve as a template for automated defect detection in InP multi-project wafer manufacturing.
A Survey of Self-Supervised and Few-Shot Object Detection
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abstract
Labeling data is often expensive and time-consuming, especially for tasks such as object detection and instance segmentation, which require dense labeling of the image. While few-shot object detection is about training a model on novel (unseen) object classes with little data, it still requires prior training on many labeled examples of base (seen) classes. On the other hand, self-supervised methods aim at learning representations from unlabeled data which transfer well to downstream tasks such as object detection. Combining few-shot and self-supervised object detection is a promising research direction. In this survey, we review and characterize the most recent approaches on few-shot and self-supervised object detection. Then, we give our main takeaways and discuss future research directions. Project page at https://gabrielhuang.github.io/fsod-survey/
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cs.CV 1years
2025 1verdicts
CONDITIONAL 1representative citing papers
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Deep Learning-based Multi Project InP Wafer Simulation for Unsupervised Surface Defect Detection
A U-Net trained on CAD layouts and flawed wafer photos can generate defect-free synthetic wafer images that serve as a template for automated defect detection in InP multi-project wafer manufacturing.