Amorphous V2O3+p thin films (p = 0.05, 0.23, 0.49) show room-temperature ferromagnetism with about 14 kA/m saturation magnetization, tunable by oxygen content.
The process began with the deposition of a 20 nm thick VO x layer, achieved through reactive sputtering with a metallic vanadium target
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Control of ferromagnetism of Vanadium Oxide thin films by oxidation states
Amorphous V2O3+p thin films (p = 0.05, 0.23, 0.49) show room-temperature ferromagnetism with about 14 kA/m saturation magnetization, tunable by oxygen content.