A semi-analytical reaction-diffusion model predicts halo growth in pre-patterned Ag-Cu thin films follows power-law regimes of 1/2 or 2/7 depending on growth dimensionality, with experiments matching the 2/7 regime driven by grain boundary diffusion.
Solberg, The crystal structure of η-Cu3Si precipitates in silicon, Acta Cryst A 34 (1978) 684–
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Reaction-Diffusion Driven Patterns in Immiscible Alloy Thin Films
A semi-analytical reaction-diffusion model predicts halo growth in pre-patterned Ag-Cu thin films follows power-law regimes of 1/2 or 2/7 depending on growth dimensionality, with experiments matching the 2/7 regime driven by grain boundary diffusion.