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arxiv: 2601.06398 · v3 · submitted 2026-01-10 · ❄️ cond-mat.mtrl-sci

Reaction-Diffusion Driven Patterns in Immiscible Alloy Thin Films

Pith reviewed 2026-05-16 16:10 UTC · model grok-4.3

classification ❄️ cond-mat.mtrl-sci
keywords Ag-Cuthin filmsreaction-diffusionhalopower lawmicrostructurediffusionannealing
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0 comments X

The pith

Reaction-diffusion in patterned Ag-Cu thin films produces halos whose growth obeys a 2/7 power law.

A machine-rendered reading of the paper's core claim, the machinery that carries it, and where it could break.

The authors model the growth of halo microstructures that form around milled patterns in Ag-Cu thin films on silicon during annealing. Their semi-analytical approach accounts for species conservation, diffusion in the film, and the moving boundary of the reaction product to derive two possible power-law growth rates. Experimental measurements of halo size versus time align with the slower 2/7 exponent, which occurs when both growth and transport are effectively two-dimensional. This understanding shows how film thickness and diffusivity set the regime and allows estimation of the controlling diffusion mechanism.

Core claim

We present a semi-analytical kinetic model of product and halo growth that incorporates species balance, diffusional transport and a modified Stefan condition. Predictions from the model reveal two distinct growth regimes of the product with power law indices of 1/2 and 2/7 and experimental data fall into the latter regime. These regimes originate from the dimensionality of growth (2d or 3d) compared to that of solute transport (2d), which in turn depend on film thickness and species diffusivity. Using an inverse optimization procedure, we also estimate the diffusivity, which suggests grain boundary diffusion to be the dominant transport mechanism.

What carries the argument

Semi-analytical kinetic model based on species balance equations, diffusional transport, and a modified Stefan condition for the moving reaction interface.

If this is right

  • The extent of the halo can be controlled by varying the temperature and duration of annealing.
  • Product growth follows either a square-root or 2/7 power law depending on whether growth is three- or two-dimensional.
  • Grain boundary diffusion is the dominant transport mechanism in the films.
  • The approach provides a framework for engineering local microstructures in alloy thin films via interfacial reactions.

Where Pith is reading between the lines

These are editorial extensions of the paper, not claims the author makes directly.

  • Patterning the substrate could be used to create designed microstructures in other thin film alloy systems.
  • Thinner films might consistently show the 2/7 regime while thicker ones transition to 1/2.
  • Validating the estimated diffusivity with independent measurements would strengthen the model's predictive power.

Load-bearing premise

The semi-analytical kinetic model correctly incorporates species balance, diffusional transport, and the modified Stefan condition, and the inverse optimization yields a physically meaningful diffusivity.

What would settle it

If halo growth rates were measured across a range of film thicknesses and showed a clear shift from 2/7 to 1/2 power law as thickness increases, this would support the dimensionality-based explanation of the regimes.

Figures

Figures reproduced from arXiv: 2601.06398 by Shourya Dutta-Gupta, Subhradeep Chatterjee, Vivek C. Peddiraju.

Figure 6
Figure 6. Figure 6: GIXRD patterns for films annealed at different temperatures and times. Vertical blue and red dashed lines represent Ag-rich and Cu-rich phases, respectively. The effect of temperature and time of annealing on the phase separation in the bulk film at 200 ℃ and 350 ℃ is illustrated in [PITH_FULL_IMAGE:figures/full_fig_p011_6.png] view at source ↗
Figure 7
Figure 7. Figure 7: Representative bulk film microstructures showing Ag-rich (bight) and Cu-rich (dark) domains formed in films when annealed at 200 oC (a – d), and 350 oC (e – h) for different times. Increasing times from left to right correspond to annealing times of 0.5 h, 1 h, 2h and 3h. The scale bar corresponds to 250 nm. During annealing at a given temperature, Cu-rich domains develop to a stable size soon after the in… view at source ↗
Figure 10
Figure 10. Figure 10: Schematic representation of the geometry, processes and variables involved in the formation of the reaction product and the halo. (a) Top view and (b) cross-sectional view. Species balance: Since the growth of Cu3Si and its associated halo are interrelated processes contingent upon the supply of Cu-atoms, we can arrive at a correlation between 𝑤𝑃 and 𝑤𝐻 [PITH_FULL_IMAGE:figures/full_fig_p014_10.png] view at source ↗
Figure 12
Figure 12. Figure 12: Sketch showing the modified Stefan balance condition. The total amount of solute supplied from the bulk of the film is redistributed to (i) flat cylindrical part at top and (ii) conical part at bottom of the product phase with two different interfacial jump conditions. The interface species balance equation is expressed by equating (1) the net rate of transport of Cu atoms through the film by diffusion wi… view at source ↗
Figure 13
Figure 13. Figure 13: (a, b) Variation of the product width (𝑤𝑃) and halo width (𝑤𝐻) with annealing time with diffusivity as a parameter. (c, d) Corresponding log-log plot of the same. The curves are generated by numerically solving the ODE in Eq. (10); green and red points are the experimental data for 300 oC and 350 oC, respectively. As [PITH_FULL_IMAGE:figures/full_fig_p019_13.png] view at source ↗
read the original abstract

Controlling the microstructure of thin films is of critical importance for various applications. We demonstrate a methodology for tuning the local microstructure through film-substrate interactions using Ag-Cu as a model system. Metastable single-phase Ag-Cu thin films are deposited on Si substrates pre-patterned by FIB milling. During post-deposition annealing, localized film-substrate reaction around the milled patterns produces a distinct microstructure termed as the 'halo'. It consists of copper silicide and almost pure Ag, while the far-field film forms a random mixture of Cu and Ag-rich domains through phase separation. We show that the extent of the halo can be controlled by varying the temperature and duration of annealing. We present a semi-analytical kinetic model of product and halo growth that incorporates species balance, diffusional transport and a modified Stefan condition. Predictions from the model reveal two distinct growth regimes of the product with power law indices of 1/2 and 2/7 and experimental data fall into the latter regime. These regimes originate from the dimensionality of growth (2d or 3d) compared to that of solute transport (2d), which in turn depend on film thickness and species diffusivity. Using an inverse optimization procedure, we also estimate the diffusivity, which suggests grain boundary diffusion to be the dominant transport mechanism. This study provides an avenue and framework for microstructural engineering of alloy thin films through interfacial reaction.

Editorial analysis

A structured set of objections, weighed in public.

Desk editor's note, referee report, simulated authors' rebuttal, and a circularity audit. Tearing a paper down is the easy half of reading it; the pith above is the substance, this is the friction.

Referee Report

2 major / 1 minor

Summary. The manuscript claims that in Ag-Cu thin films on pre-patterned Si substrates, annealing induces halo microstructures around milled patterns due to film-substrate reactions. A semi-analytical kinetic model is developed that predicts two distinct product growth regimes with power-law exponents of 1/2 (2D growth/2D transport) and 2/7 (3D growth/2D transport), depending on film thickness and diffusivity. Experimental halo growth data are shown to follow the 2/7 regime, and an inverse optimization procedure is used to estimate the diffusivity, suggesting grain boundary diffusion as the dominant mechanism. This provides a framework for microstructural engineering of alloy thin films.

Significance. If the model's regime predictions can be confirmed independently of the fitting procedure, this work offers a valuable approach to controlling local microstructures in immiscible alloy thin films through reaction-diffusion processes. The experimental observation of tunable halos and the dimensionality-based explanation of growth laws represent a useful contribution to materials science, particularly for thin film applications. However, the current linkage between model and experiment via inverse fitting limits the strength of the predictive claims.

major comments (2)
  1. [Kinetic Model and Results] Kinetic Model and Results: The derivation of the 1/2 and 2/7 power-law indices from species balance, diffusional transport, and the modified Stefan condition is central to the claim. However, the experimental data are assigned to the 2/7 regime only after inverse optimization of the diffusivity parameter against the halo growth measurements. This procedure risks circularity, as the same data used for fitting are used to validate the regime, without apparent cross-validation or independent diffusivity measurement.
  2. [Experimental Comparison] Experimental Comparison: The abstract and results section provide no error bars on the halo size measurements or sensitivity analysis on how variations in film thickness or model assumptions affect the regime assignment. This makes it difficult to assess the robustness of the conclusion that the data fall into the 2/7 regime.
minor comments (1)
  1. [Abstract] Abstract: The abstract mentions 'two distinct growth regimes of the product with power law indices of 1/2 and 2/7' but does not specify the sections where the full derivation is presented, which would aid readability.

Simulated Author's Rebuttal

2 responses · 0 unresolved

We thank the referee for their constructive and insightful comments, which have helped us improve the clarity and robustness of our manuscript. We address each major comment in detail below, providing clarifications on the independence of the model derivations and adding supporting analyses where appropriate.

read point-by-point responses
  1. Referee: Kinetic Model and Results: The derivation of the 1/2 and 2/7 power-law indices from species balance, diffusional transport, and the modified Stefan condition is central to the claim. However, the experimental data are assigned to the 2/7 regime only after inverse optimization of the diffusivity parameter against the halo growth measurements. This procedure risks circularity, as the same data used for fitting are used to validate the regime, without apparent cross-validation or independent diffusivity measurement.

    Authors: The power-law exponents are obtained analytically from the model equations (species conservation, 2D diffusional transport, and the modified Stefan condition) prior to any comparison with experiment; they depend exclusively on the relative dimensionality of growth versus transport and contain no fitted parameters. Regime assignment is performed by direct comparison of the experimentally observed growth exponent to the two analytically predicted values. The inverse optimization is used only afterward to extract the numerical diffusivity. In the revised manuscript we have added a direct comparison of fit quality for both regimes, showing that the 2/7 exponent yields a statistically superior match. The resulting diffusivity estimate is also shown to be consistent with independent literature values for grain-boundary diffusion in Ag-Cu at the relevant temperatures. revision: partial

  2. Referee: Experimental Comparison: The abstract and results section provide no error bars on the halo size measurements or sensitivity analysis on how variations in film thickness or model assumptions affect the regime assignment. This makes it difficult to assess the robustness of the conclusion that the data fall into the 2/7 regime.

    Authors: We agree that error bars and sensitivity information strengthen the presentation. The revised results section now includes error bars on all halo-size data points, obtained from the standard deviation across multiple independent measurements. A new sensitivity analysis has been added to the supplementary information that quantifies the effect of film-thickness variation (within the experimental range) and key model parameters on the predicted exponents; the analysis confirms that the 2/7 regime remains the best fit under these perturbations. revision: yes

Circularity Check

1 steps flagged

Diffusivity fitted to halo-growth data assigns the same data to the 2/7 regime

specific steps
  1. fitted input called prediction [Abstract]
    "Predictions from the model reveal two distinct growth regimes of the product with power law indices of 1/2 and 2/7 and experimental data fall into the latter regime. ... Using an inverse optimization procedure, we also estimate the diffusivity, which suggests grain boundary diffusion to be the dominant transport mechanism."

    The regime label (2/7) is decided by whether the fitted diffusivity exceeds the 2D-vs-3D threshold. Because the same halo-growth data determine both the fitted value and the claim that the data belong to the 2/7 regime, the reported agreement is forced by construction rather than tested.

full rationale

The semi-analytical model derives two fixed power-law exponents (1/2 and 2/7) from species balance, 2D transport, and the modified Stefan condition; these exponents are independent of parameters. However, which regime applies is controlled by whether the effective diffusivity places the system above or below a threshold set by film thickness. The paper obtains that diffusivity via inverse optimization on the identical halo-size-vs-time measurements used to declare that the data fall in the 2/7 branch. Consequently the regime assignment is not an independent prediction but a direct consequence of the fit. No cross-validation, hold-out data, or parameter-free test of the dimensionality threshold is reported.

Axiom & Free-Parameter Ledger

1 free parameters · 2 axioms · 0 invented entities

The central claim rests on standard diffusion and interface kinetics plus one data-fitted diffusivity parameter; no new entities are postulated.

free parameters (1)
  • diffusivity
    Estimated via inverse optimization to match observed halo growth rates; value not reported numerically in abstract.
axioms (2)
  • domain assumption Diffusional transport obeys Fick's laws within the film plane
    Invoked as the basis for species transport in the kinetic model.
  • domain assumption Modified Stefan condition governs the velocity of the product-film interface
    Used to close the moving-boundary problem for halo growth.

pith-pipeline@v0.9.0 · 5560 in / 1509 out tokens · 88409 ms · 2026-05-16T16:10:48.772659+00:00 · methodology

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Works this paper leans on

107 extracted references · 107 canonical work pages

  1. [1]

    Freund, G

    H.-J. Freund, G. Pacchioni, Oxide ultra-thin films on metals: new materials for the design of supported metal catalysts, Chemical Society Reviews 37 (2008) 2224–2242. https://doi.org/10.1039/B718768H

  2. [2]

    Mehla, J

    S. Mehla, J. Das, D. Jampaiah, S. Periasamy, A. Nafady, S.K. Bhargava, Recent advances in preparation methods for catalytic thin films and coatings, Catal. Sci. Technol. 9 (2019) 3582–

  3. [3]

    https://doi.org/10.1039/C9CY00518H

  4. [4]

    Malureanu, A

    R. Malureanu, A. Lavrinenko, Ultra-thin films for plasmonics: a technology overview, Nanotechnology Reviews 4 (2015) 259–275. https://doi.org/doi:10.1515/ntrev-2015-0021

  5. [5]

    Zhang, S

    X. Zhang, S. Ding, Z. Tang, Z. Yao, T. Zhang, C. Xiang, L. Qian, Nanostructured materials for next- generation display technology, Nat Rev Electr Eng 2 (2025) 263–276. https://doi.org/10.1038/s44287-025-00158-6

  6. [6]

    Z.W. Chen, Z. Jiao, M.H. Wu, C.H. Shek, C.M.L. Wu, J.K.L. Lai, Microstructural evolution of oxides and semiconductor thin films, Progress in Materials Science 56 (2011) 901–1029. https://doi.org/10.1016/j.pmatsci.2011.02.001

  7. [7]

    Fortunato, P

    E. Fortunato, P . Barquinha, R. Martins, Oxide Semiconductor Thin-Film Transistors: A Review of Recent Advances, Advanced Materials 24 (2012) 2945–2986. https://doi.org/10.1002/adma.201103228

  8. [8]

    Franklin, Nanomaterials in transistors: From high-performance to thin-film applications, Science 349 (2015) aab2750

    A.D. Franklin, Nanomaterials in transistors: From high-performance to thin-film applications, Science 349 (2015) aab2750. https://doi.org/10.1126/science.aab2750

  9. [9]

    Tittl, H

    A. Tittl, H. Giessen, N. Liu, Plasmonic gas and chemical sensing, Nanophotonics 3 (2014) 157–

  10. [10]

    https://doi.org/doi:10.1515/nanoph-2014-0002

  11. [11]

    Abdul, T

    S. Abdul, T. Judit, F. Ilona, M. Nikoletta, Chapter 16 - Functional thin films and nanostructures for sensors, in: A. Barhoum, A.S.H. Makhlouf (Eds.), Fundamentals of Nanoparticles, Elsevier, 2018: pp. 485–519. https://doi.org/10.1016/B978-0-323-51255-8.00016-1

  12. [12]

    T. Zhou, T. Zhang, Recent Progress of Nanostructured Sensing Materials from 0D to 3D: Overview of Structure–Property-Application Relationship for Gas Sensors, Small Methods 5 (2021) 2100515. https://doi.org/10.1002/smtd.202100515

  13. [13]

    Goijman, A.G

    V.P . Elanjeitsenni, K.S. Vadivu, B.M. Prasanth, A review on thin films, conducting polymers as sensor devices, Materials Research Express 9 (2022) 022001. https://doi.org/10.1088/2053- 1591/ac4aa1

  14. [14]

    Noked, C

    M. Noked, C. Liu, J. Hu, K. Gregorczyk, G.W. Rubloff, S.B. Lee, Electrochemical Thin Layers in Nanostructures for Energy Storage, Acc. Chem. Res. 49 (2016) 2336–2346. https://doi.org/10.1021/acs.accounts.6b00315

  15. [15]

    Moitzheim, B

    S. Moitzheim, B. Put, P .M. Vereecken, Advances in 3D Thin-Film Li-Ion Batteries, Advanced Materials Interfaces 6 (2019) 1900805. https://doi.org/10.1002/admi.201900805

  16. [16]

    Colligon, Chapter 9 Physical vapor deposition, in: C

    J.S. Colligon, Chapter 9 Physical vapor deposition, in: C. Suryanarayana (Ed.), Non-Equilibrium Processing of Materials, Pergamon, 1999: pp. 225–253. https://doi.org/10.1016/S1470- 1804(99)80055-8. 23

  17. [17]

    Ohring, Materials science of thin films: Deposition and Structure, Academic press, 2002

    M. Ohring, Materials science of thin films: Deposition and Structure, Academic press, 2002. https://doi.org/10.1016/B978-0-12-524975-1.X5000-9

  18. [18]

    Gudmundsson, A

    J.T. Gudmundsson, A. Anders, A. von Keudell, Foundations of physical vapor deposition with plasma assistance, Plasma Sources Sci. Technol. 31 (2022) 083001. https://doi.org/10.1088/1361-6595/ac7f53

  19. [19]

    Cantor, R.W

    B. Cantor, R.W. Cahn, Metastable alloy phases by co-sputtering, Acta Metallurgica 24 (1976) 845–

  20. [20]

    https://doi.org/10.1016/0001-6160(76)90051-1

  21. [21]

    Saunders, A.P

    N. Saunders, A.P . Miodownik, Phase formation in co-deposited metallic alloy thin films, J Mater Sci 22 (1987) 629–637. https://doi.org/10.1007/BF01160780

  22. [22]

    Porter, K.E

    D.A. Porter, K.E. Easterling, M.Y . Sherif, Phase Transformations in Metals and Alloys, 4th ed., CRC Press, Boca Raton, 2021. https://doi.org/10.1201/9781003011804

  23. [23]

    Chung, H

    H. Chung, H. Wang, R.J. Composto, A Morphology Map Based on Phase Evolution in Polymer Blend Films, Macromolecules 39 (2006) 153–161. https://doi.org/10.1021/ma051513z

  24. [24]

    Derby, Y

    B. Derby, Y . Cui, J.K. Baldwin, A. Misra, Effects of substrate temperature and deposition rate on the phase separated morphology of co-sputtered, Cu-Mo thin films, Thin Solid Films 647 (2018) 50–56. https://doi.org/10.1016/j.tsf.2017.12.013

  25. [25]

    Powers, B

    M. Powers, B. Derby, A. Shaw, E. Raeker, A. Misra, Microstructural characterization of phase- separated co-deposited Cu–Ta immiscible alloy thin films, Journal of Materials Research 35 (2020) 1531–1542. https://doi.org/10.1557/jmr.2020.100

  26. [26]

    Powers, Hierarchical morphologies in co-sputter deposited thin films, Phys

    M. Powers, Hierarchical morphologies in co-sputter deposited thin films, Phys. Rev. Mater. 4 (2020). https://doi.org/10.1103/PhysRevMaterials.4.123801

  27. [27]

    Bandaru, S

    P . Bandaru, S. Bhattacharyya, S. Dutta-Gupta, Insights into propagating surface plasmons in Ag– Cu alloy thin films: Enhancement of spin angular momentum of light, Journal of Applied Physics 132 (2022) 183101. https://doi.org/10.1063/5.0119124

  28. [28]

    Vonka, J

    M. Vonka, J. Kosek, Modelling the morphology evolution of polymer materials undergoing phase separation, Chemical Engineering Journal 207–208 (2012) 895–905. https://doi.org/10.1016/j.cej.2012.06.091

  29. [29]

    Stewart, R

    J.A. Stewart, R. Dingreville, Microstructure morphology and concentration modulation of nanocomposite thin-films during simulated physical vapor deposition, Acta Materialia 188 (2020) 181–191. https://doi.org/10.1016/j.actamat.2020.02.011

  30. [30]

    Powers, J.A

    M. Powers, J.A. Stewart, R. Dingreville, B.K. Derby, A. Misra, Compositionally-Driven Formation Mechanism of Hierarchical Morphologies in Co-Deposited Immiscible Alloy Thin Films, Nanomaterials 11 (2021) 2635. https://doi.org/10.3390/nano11102635

  31. [31]

    Y . Lu, B. Derby, H. Sriram, K. Kadirvel, C. Wang, X. Liu, A. Misra, Y . Wang, Microstructure development and morphological transition during deposition of immiscible alloy films, Acta Materialia 220 (2021) 117313. https://doi.org/10.1016/j.actamat.2021.117313

  32. [32]

    Adams, M

    C.D. Adams, M. Atzmon, Y .-T. Cheng, D.J. Srolovitz, Al-Ge Phase Separation During Vapor Deposition, MRS Online Proceedings Library 187 (1990) 33–38. https://doi.org/10.1557/PROC- 187-33

  33. [33]

    Adams, M

    C.D. Adams, M. Atzmon, Y .-T. Cheng, D.J. Srolovitz, Phase separation during co-deposition of Al– Ge thin films, Journal of Materials Research 7 (1992) 653–666. https://doi.org/10.1557/JMR.1992.0653

  34. [34]

    Walheim, M

    S. Walheim, M. Böltau, J. Mlynek, G. Krausch, U. Steiner, Structure Formation via Polymer Demixing in Spin-Cast Films, Macromolecules 30 (1997) 4995–5003. https://doi.org/10.1021/ma9619288

  35. [35]

    Ogawa, T

    H. Ogawa, T. Kanaya, K. Nishida, G. Matsuba, Phase separation and dewetting in polystyrene/poly(vinyl methyl ether) blend thin films in a wide thickness range, Polymer 49 (2008) 254–262. https://doi.org/10.1016/j.polymer.2007.11.031

  36. [36]

    Wong, Spinodal Clustering in Thin Films of Nanoparticle-Polymer Mixtures, Phys

    H.C. Wong, Spinodal Clustering in Thin Films of Nanoparticle-Polymer Mixtures, Phys. Rev. Lett. 105 (2010). https://doi.org/10.1103/PhysRevLett.105.038301. 24

  37. [37]

    Jones, Surface-directed spinodal decomposition, Phys

    R.A.L. Jones, Surface-directed spinodal decomposition, Phys. Rev. Lett. 66 (1991) 1326–1329. https://doi.org/10.1103/PhysRevLett.66.1326

  38. [38]

    Krausch, Real space observation of dynamic scaling in a critical polymer mixture, Phys

    G. Krausch, Real space observation of dynamic scaling in a critical polymer mixture, Phys. Rev. Lett. 71 (1993) 3669–3672. https://doi.org/10.1103/PhysRevLett.71.3669

  39. [39]

    Puri, Surface-directed spinodal decomposition, J

    S. Puri, Surface-directed spinodal decomposition, J. Phys.: Condens. Matter 17 (2005) R101. https://doi.org/10.1088/0953-8984/17/3/R01

  40. [40]

    Bruder, Spinodal decomposition in thin films of a polymer blend, Phys

    F. Bruder, Spinodal decomposition in thin films of a polymer blend, Phys. Rev. Lett. 69 (1992) 624–627. https://doi.org/10.1103/PhysRevLett.69.624

  41. [41]

    Winesett, H

    D.A. Winesett, H. Ade, J. Sokolov, M. Rafailovich, S. Zhu, Substrate dependence of morphology in thin film polymer blends of polystyrene and poly(methyl methacrylate), Polymer International 49 (2000) 458–462. https://doi.org/10.1002/(SICI)1097-0126(200005)49:5%253C458::AID- PI373%253E3.0.CO;2-5

  42. [42]

    D.U. Ahn, Z. Wang, I.P . Campbell, M.P . Stoykovich, Y . Ding, Morphological evolution of thin PS/PMMA films: Effects of surface energy and blend composition, Polymer 53 (2012) 4187–4194. https://doi.org/10.1016/j.polymer.2012.07.037

  43. [43]

    Böltau, S

    M. Böltau, S. Walheim, J. Mlynek, G. Krausch, U. Steiner, Surface-induced structure formation of polymer blends on patterned substrates, Nature 391 (1998) 877–879. https://doi.org/10.1038/36075

  44. [44]

    Combined use of several preferred retinal loci in patients with macular disorders when reading single words

    P . Cyganik, A. Bernasik, A. Budkowski, B. Bergues, K. Kowalski, J. Rysz, J. Lekki, M. Lekka, Z. Postawa, Phase decomposition in polymer blend films cast on substrates patterned with self- assembled monolayers, Vacuum 63 (2001) 307–313. https://doi.org/10.1016/S0042- 207X(01)00206-8

  45. [45]

    L. Cui, Z. Zhang, X. Li, Y . Han, Surface-induced Phase Separation of Binary Polymer Blends on the Chemically Patterned Substrate, Polym. Bull. 55 (2005) 131–140. https://doi.org/10.1007/s00289-005-0404-3

  46. [46]

    Harirchian-Saei, M.C.P

    S. Harirchian-Saei, M.C.P . Wang, B.D. Gates, M.G. Moffitt, Directed Polystyrene/Poly(methyl methacrylate) Phase Separation and Nanoparticle Ordering on Transparent Chemically Patterned Substrates, Langmuir 28 (2012) 10838–10848. https://doi.org/10.1021/la301298p

  47. [47]

    Zheng, F

    H. Zheng, F. Straub, Q. Zhan, P .-L. Yang, W.-K. Hsieh, F. Zavaliche, Y .-H. Chu, U. Dahmen, R. Ramesh, Self-Assembled Growth of BiFeO3–CoFe2O4 Nanostructures, Advanced Materials 18 (2006) 2747–2752. https://doi.org/10.1002/adma.200601215

  48. [48]

    Lahiri, T.A

    A. Lahiri, T.A. Abinandanan, M.P . Gururajan, S. Bhattacharyya, Effect of epitaxial strain on phase separation in thin films, Philosophical Magazine Letters 94 (2014) 702–707. https://doi.org/10.1080/09500839.2014.968652

  49. [49]

    Z. Chen, X. Wang, Y . Qi, S. Yang, J.A.N.T. Soares, B.A. Apgar, R. Gao, R. Xu, Y . Lee, X. Zhang, J. Yao, L.W. Martin, Self-Assembled, Nanostructured, Tunable Metamaterials via Spinodal Decomposition, ACS Nano 10 (2016) 10237–10244. https://doi.org/10.1021/acsnano.6b05736

  50. [50]

    G. Sun, X. Cao, Y . Yue, X. Gao, S. Long, N. Li, R. Li, H. Luo, P . Jin, Multi-nanolayered VO2/Sapphire Thin Film via Spinodal Decomposition, Sci Rep 8 (2018) 5342. https://doi.org/10.1038/s41598- 018-23412-4

  51. [51]

    Lau, J.W

    S.S. Lau, J.W. Mayer, K.N. Tu, Interactions in the Co/Si thin-film system. I. Kinetics, J. Appl. Phys. 49 (1978) 4005–4010. https://doi.org/10.1063/1.325359

  52. [52]

    K.N. Tu, G. Ottaviani, R.D. Thompson, J.W. Mayer, Thermal stability and growth kinetics of Co2Si and CoSi in thin-film reactions, J. Appl. Phys. 53 (1982) 4406–4410. https://doi.org/10.1063/1.331223

  53. [53]

    Ottaviani, Phase Formation and Kinetic Processes in Silicide Growth, MRS Online Proceedings Library 25 (1983) 21–31

    G. Ottaviani, Phase Formation and Kinetic Processes in Silicide Growth, MRS Online Proceedings Library 25 (1983) 21–31. https://doi.org/10.1557/PROC-25-21

  54. [54]

    Mayer, S.S

    J.W. Mayer, S.S. Lau, K.N. Tu, Silicide formation with Pd-V alloys and bilayers, Journal of Applied Physics 50 (1979) 5855–5859. https://doi.org/10.1063/1.326733

  55. [55]

    K.N. Tu, W.N. Hammer, J.O. Olowolafe, Shallow silicide contact, J. Appl. Phys. 51 (1980) 1663–

  56. [56]

    https://doi.org/10.1063/1.327773. 25

  57. [57]

    Koma, Van der Waals epitaxy —a new epitaxial growth method for a highly lattice - mismatched system, Thin Solid Films 216 (1992) 72 –76

    N. Mattoso Filho, C. Achete, F.L. Freire, Silicide formation and phase separation from Cu/Nb and Nb/Cu bilayers on silicon, Thin Solid Films 220 (1992) 184–190. https://doi.org/10.1016/0040- 6090(92)90570-2

  58. [58]

    Gromov, A.I

    D.G. Gromov, A.I. Mochalov, V.P . Pugachevich, I.N. Sorokin, Interaction between binary alloy thin films and silicon substrate: the conditions of bilayer formation and the effect of additional component, Appl Phys A 70 (2000) 333–340. https://doi.org/10.1007/s003390050056

  59. [59]

    Peddiraju, P

    V.C. Peddiraju, P . Bandaru, S. Dutta-Gupta, S. Chatterjee, Substrate interaction mediated control of phase separation in FIB milled Ag–Cu thin films, APL Mater. 12 (2024) 011101. https://doi.org/10.1063/5.0181879

  60. [61]

    Karim, J.F

    A. Karim, J.F. Douglas, G. Nisato, D.-W. Liu, E.J. Amis, Transient Target Patterns in Phase Separating Filled Polymer Blends, Macromolecules 32 (1999) 5917–5924. https://doi.org/10.1021/ma990439f

  61. [62]

    Lee, J.F

    B.P . Lee, J.F. Douglas, S.C. Glotzer, Filler-induced composition waves in phase-separating polymer blends, Phys. Rev. E 60 (1999) 5812–5822. https://doi.org/10.1103/PhysRevE.60.5812

  62. [63]

    Ghosh, A

    S. Ghosh, A. Mukherjee, R. Arroyave, J.F. Douglas, Impact of particle arrays on phase separation composition patterns, The Journal of Chemical Physics 152 (2020) 224902. https://doi.org/10.1063/5.0007859

  63. [64]

    Chabinyc, W.S

    M.L. Chabinyc, W.S. Wong, A. Salleo, K.E. Paul, R.A. Street, Organic polymeric thin-film transistors fabricated by selective dewetting, Applied Physics Letters 81 (2002) 4260–4262. https://doi.org/10.1063/1.1524301

  64. [65]

    B. Yoon, H. Acharya, G. Lee, H.-C. Kim, J. Huh, C. Park, Nanopatterning of thin polymer films by controlled dewetting on a topographic pre-pattern, Soft Matter 4 (2008) 1467–1472. https://doi.org/10.1039/B800121A

  65. [66]

    Bhandaru, A

    N. Bhandaru, A. Karim, R. Mukherjee, Directed ordering of phase separated domains and dewetting of thin polymer blend films on a topographically patterned substrate, Soft Matter 13 (2017) 4709–4719. https://doi.org/10.1039/C7SM00799J

  66. [67]

    Thompson, Solid-State Dewetting of Thin Films, Annual Review of Materials Research 42 (2012) 399–434

    C.V. Thompson, Solid-State Dewetting of Thin Films, Annual Review of Materials Research 42 (2012) 399–434. https://doi.org/10.1146/annurev-matsci-070511-155048

  67. [68]

    Olesinski, G.J

    R.W. Olesinski, G.J. Abbaschian, The Cu−Si (Copper-Silicon) system, Bulletin of Alloy Phase Diagrams 7 (1986) 170–178. https://doi.org/10.1007/BF02881559

  68. [69]

    Sufryd, N

    K. Sufryd, N. Ponweiser, P . Riani, K.W. Richter, G. Cacciamani, Experimental investigation of the Cu–Si phase diagram at x(Cu)>0.72, Intermetallics 19 (2011) 1479–1488. https://doi.org/10.1016/j.intermet.2011.05.017

  69. [70]

    Cros, M.O

    A. Cros, M.O. Aboelfotoh, K.N. Tu, Formation, oxidation, electronic, and electrical properties of copper silicides, Journal of Applied Physics 67 (1990) 3328–3336. https://doi.org/10.1063/1.345369

  70. [71]

    Chang, Formation of copper silicides from Cu(100)/Si(100) and Cu(111)/Si(111) structures, Journal of Applied Physics 67 (1990) 566–569

    C. Chang, Formation of copper silicides from Cu(100)/Si(100) and Cu(111)/Si(111) structures, Journal of Applied Physics 67 (1990) 566–569. https://doi.org/10.1063/1.345194

  71. [72]

    Stolt, F.M

    L. Stolt, F.M. D’Heurle, The formation of Cu3Si: Marker experiments, Thin Solid Films 189 (1990) 269–274. https://doi.org/10.1016/0040-6090(90)90455-M

  72. [73]

    Solberg, The crystal structure of η-Cu3Si precipitates in silicon, Acta Cryst A 34 (1978) 684–

    J.K. Solberg, The crystal structure of η-Cu3Si precipitates in silicon, Acta Cryst A 34 (1978) 684–

  73. [74]

    https://doi.org/10.1107/S0567739478001448

  74. [75]

    C.-Y . Wen, F. Spaepen, In situ electron microscopy of the phases of Cu3Si, Philosophical Magazine 87 (2007) 5581–5599. https://doi.org/10.1080/14786430701675829

  75. [76]

    Mattern, R

    N. Mattern, R. Seyrich, L. Wilde, C. Baehtz, M. Knapp, J. Acker, Phase formation of rapidly quenched Cu–Si alloys, Journal of Alloys and Compounds 429 (2007) 211–215. https://doi.org/10.1016/j.jallcom.2006.04.046. 26

  76. [77]

    Palatinus, M

    L. Palatinus, M. Klementová, V. Dřínek, M. Jarošová, V. Petříček, An Incommensurately Modulated Structure of η′-Phase of Cu3+xSi Determined by Quantitative Electron Diffraction Tomography, Inorg. Chem. 50 (2011) 3743–3751. https://doi.org/10.1021/ic200102z

  77. [78]

    Corrêa, O

    C.A. Corrêa, O. Perez, J. Kopeček, P . Brázda, M. Klementová, L. Palatinus, Crystal structures of η′′- Cu3+xSi and η′′′-Cu3+xSi, Acta Cryst B 73 (2017) 767–774. https://doi.org/10.1107/S2052520617006163

  78. [79]

    Corrêa, M

    C.A. Corrêa, M. Poupon, J. Kopeček, R. Král, P . Zemenová, J. Lecourt, N. Barrier, P . Brázda, M. Klementová, L. Palatinus, Phase transitions of Cu3+xSi observed by temperature-dependent x-ray powder diffraction, Intermetallics 91 (2017) 129–139. https://doi.org/10.1016/j.intermet.2017.07.003

  79. [80]

    Dodony, G.Z

    E. Dodony, G.Z. Radnóczi, I. Dódony, Low temperature formation of copper rich silicides, Intermetallics 107 (2019) 108–115. https://doi.org/10.1016/j.intermet.2019.01.010

  80. [81]

    Guo, Z.K

    Y .X. Guo, Z.K. Hei, Y .K. Wu, K.H. Kuo, A TEM study of the crystallization of amorphous Ni67Zr33 alloy I. Metastable phases formed during crystallization, Philosophical Magazine B 52 (1985) 869–880. https://doi.org/10.1080/13642818508238932

Showing first 80 references.