An ADMM solver is developed for inverse lithography optimization that splits the problem into subproblems solved efficiently, including an analytical threshold truncation for the imaging function, with convergence analysis and numerical tests.
Inverse lithography technology: 30 years from concept to prac- tical, full-chip reality
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An Alternating Direction Method of Multipliers for Inverse Lithography Problem
An ADMM solver is developed for inverse lithography optimization that splits the problem into subproblems solved efficiently, including an analytical threshold truncation for the imaging function, with convergence analysis and numerical tests.