Treating finished aluminum-on-silicon superconducting devices with atomic layer etching and deposition reduced two-level-system loss and raised median transmon T1 from about 101 to 196 microseconds.
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Improving the lifetime of aluminum-based superconducting qubits through atomic layer etching and deposition
Treating finished aluminum-on-silicon superconducting devices with atomic layer etching and deposition reduced two-level-system loss and raised median transmon T1 from about 101 to 196 microseconds.