Polycrystalline ε-FeSi thin films exhibit intrinsic anomalous Hall effect from Berry phase and Weyl semimetal chiral anomaly signatures, with estimated Weyl point separation of 0.36.
This temperature independent scaling clearly indicates AHE intrinsic nature originated from non-zero Berry curvature [9]
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Experimental Signatures of Topological Transport in Polycrystalline FeSi Thin Films
Polycrystalline ε-FeSi thin films exhibit intrinsic anomalous Hall effect from Berry phase and Weyl semimetal chiral anomaly signatures, with estimated Weyl point separation of 0.36.