Polycrystalline ε-FeSi thin films exhibit intrinsic anomalous Hall effect from Berry phase and Weyl semimetal chiral anomaly signatures, with estimated Weyl point separation of 0.36.
Experimental Signatures of Topological Transport in Polycrystalline FeSi Thin Films
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Experimental Signatures of Topological Transport in Polycrystalline FeSi Thin Films
Polycrystalline ε-FeSi thin films exhibit intrinsic anomalous Hall effect from Berry phase and Weyl semimetal chiral anomaly signatures, with estimated Weyl point separation of 0.36.