First high-fidelity SiMOS spin qubits fabricated with EUV lithography show 99.9% single-qubit and ~99% two-qubit gate fidelities across four double-dot systems.
Physical Review Letters116, 110402 (2016)
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SiMOS quantum-dot spin qubits enabled by extreme-ultraviolet lithography
First high-fidelity SiMOS spin qubits fabricated with EUV lithography show 99.9% single-qubit and ~99% two-qubit gate fidelities across four double-dot systems.