Reference change · event page

& Ono, K

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Correction Crossref 1 open · 1 total · 0 disputed

DOI: 10.1063/1.4937449
Notice DOI: 10.1063/1.4941034
Event date: 2016-02-02
Machine twin: JSON

01One-hop citing occurrences

Correction Open

Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM

ref [33] · 2502.09031 · notice #9221 · dispute

Raw extraction · bibliography line

Nakazaki, N., Takao, Y ., Eriguchi, K. & Ono, K. Molecular dynamics simulations of si etching in cl- and br-based plasmas: Cl+ and br+ ion incidence in the presence of cl and br neutrals . J. Appl. Phys. 118, 233304, DOI: 10.1063/1.4937449 (2015). https://pubs.aip.org/aip/jap/article-pdf/doi/10.106 3/1.4937449/15170844/233304_1_online.pdf

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