Citation notice #9221 · 2026-08-08 00:17:54.700377+00:00
Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM
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cites & Ono, K, which carries a correction notice dated 2016-02-02. One-hop deterministic notice: the citation edge exists in the Pith bibliography graph; no model judged whether the citation was load-bearing.
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01Evidence
Raw extraction · bibliography line · bibliography index 33
Nakazaki, N., Takao, Y ., Eriguchi, K. & Ono, K. Molecular dynamics simulations of si etching in cl- and br-based plasmas: Cl+ and br+ ion incidence in the presence of cl and br neutrals . J. Appl. Phys. 118, 233304, DOI: 10.1063/1.4937449 (2015). https://pubs.aip.org/aip/jap/article-pdf/doi/10.106 3/1.4937449/15170844/233304_1_online.pdf
02Event
- Type
- Correction
- Source
- Crossref
- Original DOI
- 10.1063/1.4937449
- Notice DOI
- 10.1063/1.4941034
- Date
- 2016-02-02
- Title
- Publisher's Note: “Molecular dynamics simulations of Si etching in Cl- and Br-based plasmas: Cl+ and Br+ ion incidence in the presence of Cl and Br neutrals” [J. Appl. Phys. <b>118</b> , 233304 (2015)]
- Reasons
- ['Correction']
- Work
- & Ono, K (2015)
03Dispute this notice
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