Large area buried nanopatterning by broad ion implantation without any mask or direct writing

We have introduced here a simple, single step and cost effective broad ion beam technique for preparation of nanoscale electronic, magnetic, optical and mechanical devices without the need of resist, mask, or focused electron and ion beams. In this approach, broad beam ion implantation of desired atom on a prefabricated ion beam patterned surface promotes site selective deposition by adjusting the local angle of ion implantation. We show that implantation of Fe ions on an O+ induced pre fabricated triangular shaped patterned Si surface results in a self-organized periodic array of striped magnetic nanostructures having several micron length and about 50 nm width arranged with a lateral separation of ~ 200 nm. The morphology, composition, crystalline structure and magnetic property of these nanopatterns have been analyzed and the crucial feature of such nanopattern formation by broad beam ion implantation is explained.