A Review of Proximity Effect Correction in Electron-beam Lithography
classification
❄️ cond-mat.mes-hall
keywords
correctioneffectelectron-beamlithographymodificationproximityreviewdose
read the original abstract
I review the work of proximity effect correction (PEC) in electron-beam (e-beam) lithography with emphasis on dose modification and shape modification PEC techniques.
This paper has not been read by Pith yet.
discussion (0)
Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.