Hybrid cold and hot-wall chamber for fast synthesis of uniform graphene

We introduce a novel modality in the CVD growth of graphene which combines the cold-wall and hot-wall reaction chambers. This hybrid mode preserves the advantages of a cold-wall chamber as the fast growth and low fuel consumption, but boosts the quality of the growth towards conventional CVD with hot-wall chambers. The synthesized graphene is uniform and monolayer. The electronic transport measurements shows great improvements in charge carrier mobility compared to graphene synthesized in a normal cold-wall reaction chamber. Our results promise the development of a fast and cost-efficient growth of high quality graphene, suitable for scalable industrial applications.